Authors:
Galiev, GB
Mokerov, VG
Saraikin, VV
Slepnev, YV
Shagimuratov, GI
Imamov, RM
Pashaev, EM
Citation: Gb. Galiev et al., Study of the structural perfection and distribution/redistribution of silicon in epitaxial GaAs films grown by molecular beam epitaxy on (100), (111)A, and (111)B substrates, TECH PHYS, 46(4), 2001, pp. 411-416
Citation: Gb. Galiev et al., A study of the electrical and optical properties of Si delta-doped GaAs layers grown by MBE on a (111)A GaAs surface misoriented toward the [2(1)over-bar(1)over-bar] direction, SEMICONDUCT, 35(4), 2001, pp. 409-414
Authors:
Galiev, GB
Kaminskii, VE
Mokerov, VG
Velikhovskii, LE
Citation: Gb. Galiev et al., The use of the amphoteric nature of impurity silicon atoms for obtaining planar p-n junctions on GaAs (111)A substrates by molecular beam epitaxy, SEMICONDUCT, 35(4), 2001, pp. 415-418
Citation: Gb. Galiev et al., Effect of misorientation angle on the photoluminescence spectra of Si (delta)-doped GaAs (111)A layers grown by molecular beam epitaxy, DOKL PHYS, 46(2), 2001, pp. 88-91
Citation: Gb. Galiev et al., Investigation of distribution and redistribution of silicon in thin doped gallium-arsenide layers grown by molecular beam epitaxy on substrates with (100), (111)Ga, and (111)As orientations, SEMICONDUCT, 34(7), 2000, pp. 741-745
Citation: Gb. Galiev et al., Properties and structure of GaAs films grown by molecular beam epitaxy on GaAs substrates with the (100), (111)A, and (111)B orientations, TECH PHYS, 44(7), 1999, pp. 801-803
Citation: Vg. Mokerov et al., Influence of crystal orientation of the growth surface due to molecular beam epitaxy on the optical properties of Si-doped GaAs layers, SEMICONDUCT, 32(11), 1998, pp. 1175-1178