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Results:
1-14
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Results: 14
Authors:
Justicia, I
Ayllon, JA
Figueras, A
Battiston, GA
Gerbasi, R
Citation: I. Justicia et al., Photodegradative properties of TiO2 films prepared by MOCVD, J PHYS IV, 11(PR3), 2001, pp. 363-369
Nanophased ZrO2-CeO2 or TiO2-ZrO2-CeO2 films by CVD as catalysts for hydrocarbon complete combustion
Authors:
Barreca, D
Battiston, GA
Casellato, U
Gerbasi, R
Roncari, E
Tondello, E
Zanella, P
Citation: D. Barreca et al., Nanophased ZrO2-CeO2 or TiO2-ZrO2-CeO2 films by CVD as catalysts for hydrocarbon complete combustion, J PHYS IV, 11(PR3), 2001, pp. 453-460
Authors:
Barreca, D
Battiston, GA
Carta, G
Gerbasi, R
Rossetto, G
Tondello, E
Zanella, P
Citation: D. Barreca et al., Al2O3 growth optimisation using aluminium dimethylisopropoxide as precursor as a function of reaction conditions and reacting gases, J PHYS IV, 11(PR3), 2001, pp. 539-546
Authors:
Drozdov, A
Troyanov, SI
Pettinari, C
Marchetti, F
Santini, C
Pettinari, R
Battiston, GA
Gerbasi, R
Citation: A. Drozdov et al., New volatile polyazolylborates of copper(I) for MOCVD, J PHYS IV, 11(PR3), 2001, pp. 585-592
Authors:
Battiston, GA
Gerbasi, R
Citation: Ga. Battiston et R. Gerbasi, Gas phase vibrations as a tool for the characterization of CVD precursors and processes, CHEM VAPOR, 7(5), 2001, pp. 225-229
Authors:
Battiston, GA
Carta, G
Cavinato, G
Gerbasi, R
Porchia, M
Rossetto, G
Citation: Ga. Battiston et al., MOCVD of Al2O3 films using new dialkylaluminum acetylacetonate precursors:Growth kinetics and process yields, CHEM VAPOR, 7(2), 2001, pp. 69-74
Authors:
Pettinari, C
Marchetti, F
Santini, C
Pettinari, R
Drozdov, A
Troyanov, S
Battiston, GA
Gerbasi, R
Citation: C. Pettinari et al., Structure and volatility of copper complexes containing pyrazolyl-based ligands, INORG CHIM, 315(1), 2001, pp. 88-95
Authors:
Daniele, S
Bragato, C
Battiston, GA
Gerbasi, R
Citation: S. Daniele et al., Voltammetric characterisation of Pt-TiO2 composite nanomaterials prepared by metal organic chemical vapour deposition (MOCVD), ELECTR ACT, 46(19), 2001, pp. 2961-2966
Authors:
Barreca, D
Battiston, GA
Gerbasi, R
Tondello, E
Citation: D. Barreca et al., Al2O3 thin films from aluminium dimethylisopropoxide by metal-organic chemical vapour deposition, J MAT CHEM, 10(9), 2000, pp. 2127-2130
Authors:
Battiston, GA
Gerbasi, R
Gregori, A
Porchia, M
Cattarin, S
Rizzi, GA
Citation: Ga. Battiston et al., PECVD of amorphous TiO2 thin films: effect of growth temperature and plasma gas composition, THIN SOL FI, 371(1-2), 2000, pp. 126-131
Authors:
Battiston, GA
Carta, G
Gerbasi, R
Porchia, M
Rizzo, L
Rossetto, G
Citation: Ga. Battiston et al., Gas-phase FT-IR analysis and growth kinetics of Al2O3 in a LP-MOCVD reactor using new dialkylacetylacetonate precursors, J PHYS IV, 9(P8), 1999, pp. 675-681
Authors:
Barreca, D
Battiston, GA
Caccavalec, F
di Noto, V
Gerbasi, R
Gregori, A
Rizzi, GA
Tiziani, A
Tondello, E
Citation: D. Barreca et al., A PE-MOCVD route to V2O5 nanostructured thin films, J PHYS IV, 9(P8), 1999, pp. 529-536
Authors:
Battiston, GA
Gerbasi, R
Porchia, M
Rizzo, L
Citation: Ga. Battiston et al., TiO2 coating by atmospheric pressure MOCVD in a conveyor belt furnace for industrial applications, CHEM VAPOR, 5(2), 1999, pp. 73
Authors:
Battiston, GA
Gerbasi, R
Porchia, M
Gasparotto, A
Citation: Ga. Battiston et al., Metal organic CVD of nanostructured composite TiO2-Pt thin films: A kinetic approach, CHEM VAPOR, 5(1), 1999, pp. 13-20
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