AAAAAA

   
Results: 1-11 |
Results: 11
MICROFABRICATION AND CHARACTERIZATION OF GRIDDED POLYCRYSTALLINE SILICON FIELD EMITTER DEVICES
Authors: HUQ SE HUANG M WILSHAW PR PREWETT PD
Citation: Se. Huq et al., MICROFABRICATION AND CHARACTERIZATION OF GRIDDED POLYCRYSTALLINE SILICON FIELD EMITTER DEVICES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(2), 1998, pp. 796-798
FABRICATION AND CHARACTERIZATION OF ULTRA SHARP SILICON FIELD EMITTERS
Authors: HUQ SE GRAYER GH MOON SW PREWETT PD
Citation: Se. Huq et al., FABRICATION AND CHARACTERIZATION OF ULTRA SHARP SILICON FIELD EMITTERS, Materials science & engineering. B, Solid-state materials for advanced technology, 51(1-3), 1998, pp. 150-153
COMPARATIVE-STUDY OF GATED SINGLE-CRYSTAL SILICON AND POLYSILICON FIELD EMITTERS
Authors: HUQ SE GRAYER GH PREWETT PD
Citation: Se. Huq et al., COMPARATIVE-STUDY OF GATED SINGLE-CRYSTAL SILICON AND POLYSILICON FIELD EMITTERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2855-2858
DEEP, 3-DIMENSIONAL LITHOGRAPHY WITH A LASER-PLASMA X-RAY SOURCE AT 1-NM WAVELENGTH
Authors: TURCU ICE MANN CM MOON SW ALLOTT R LISI N MADDISON BJ HUQ SE KIM NS
Citation: Ice. Turcu et al., DEEP, 3-DIMENSIONAL LITHOGRAPHY WITH A LASER-PLASMA X-RAY SOURCE AT 1-NM WAVELENGTH, Microelectronic engineering, 35(1-4), 1997, pp. 541-544
POLYCRYSTALLINE SILICON FIELD EMITTERS
Authors: BOSWELL EC HUQ SE HUANG M PREWETT PD WILSHAW PR
Citation: Ec. Boswell et al., POLYCRYSTALLINE SILICON FIELD EMITTERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 1910-1913
ELECTRON-BEAM LITHOGRAPHY USING CHEMICALLY-AMPLIFIED RESIST - RESOLUTION AND PROFILE CONTROL
Authors: KUDRYASHOV VA KRASNOV VV HUQ SE PREWETT PD HALL TJ
Citation: Va. Kudryashov et al., ELECTRON-BEAM LITHOGRAPHY USING CHEMICALLY-AMPLIFIED RESIST - RESOLUTION AND PROFILE CONTROL, Microelectronic engineering, 30(1-4), 1996, pp. 305-308
TERAHERTZ WAVE-GUIDE COMPONENTS FABRICATED USING A 3D X-RAY MICROFABRICATION TECHNIQUE
Authors: MOON SW MANN CM MADDISON BJ TURCU ICE ALLOT R HUQ SE LISI N
Citation: Sw. Moon et al., TERAHERTZ WAVE-GUIDE COMPONENTS FABRICATED USING A 3D X-RAY MICROFABRICATION TECHNIQUE, Electronics Letters, 32(19), 1996, pp. 1794-1795
FABRICATION OF SUB-10 NM SILICON TIPS - A NEW APPROACH
Authors: HUQ SE CHEN L PREWETT PD
Citation: Se. Huq et al., FABRICATION OF SUB-10 NM SILICON TIPS - A NEW APPROACH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2718-2721
SUB10NM SILICON FIELD EMITTERS PRODUCED BY ELECTRON-BEAM LITHOGRAPHY AND ISOTROPIC PLASMA-ETCHING
Authors: HUQ SE CHEN L PREWETT PD
Citation: Se. Huq et al., SUB10NM SILICON FIELD EMITTERS PRODUCED BY ELECTRON-BEAM LITHOGRAPHY AND ISOTROPIC PLASMA-ETCHING, Microelectronic engineering, 27(1-4), 1995, pp. 95-98
CHEMICALLY AMPLIFIED AZPN114 ELECTRON-BEAM RESIST FOR ADVANCED PHOTOMASK FABRICATION
Authors: HUQ SE PREWETT PD HERMAN P
Citation: Se. Huq et al., CHEMICALLY AMPLIFIED AZPN114 ELECTRON-BEAM RESIST FOR ADVANCED PHOTOMASK FABRICATION, Microelectronic engineering, 26(2), 1995, pp. 107-117
A SYSTEMATIC CHARACTERIZATION OF AZPN114 ELECTRON-BEAM RESIST
Authors: HUQ SE MOODY RA HERMAN P PREWETT PD
Citation: Se. Huq et al., A SYSTEMATIC CHARACTERIZATION OF AZPN114 ELECTRON-BEAM RESIST, Microelectronic engineering, 23(1-4), 1994, pp. 291-294
Risultati: 1-11 |