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Results: 1-25/44
Authors:
IM J
KRAUSS AR
AUCIELLO O
GRUEN DM
CHANG RPH
Citation: J. Im et al., MASS-SPECTROSCOPY OF RECOILED ION INVESTIGATION OF ELECTRODE SEGREGATION EFFECTS DURING THE INITIAL-STAGES OF SRBI2TA2O9 FILM GROWTH, Integrated ferroelectrics (Print), 22(1-4), 1998, pp. 743-755
Authors:
QIN LC
ZHOU D
KRAUSS AR
GRUEN DM
Citation: Lc. Qin et al., TEM CHARACTERIZATION OF NANODIAMOND THIN-FILMS, Nanostructured materials, 10(4), 1998, pp. 649-660
Authors:
GOYETTE AN
LAWLER JE
ANDERSON LW
GRUEN DM
MCCAULEY TG
ZHOU D
KRAUSS AR
Citation: An. Goyette et al., C-2 SWAN BAND EMISSION INTENSITY AS A FUNCTION OF C-2 DENSITY, Plasma sources science & technology, 7(2), 1998, pp. 149-153
Authors:
KRAUSS AR
IM J
SMENTKOWSKI V
SCHULTZ J
AUCIELLO O
GRUEN DM
HOLOCEK J
CHANG RPH
Citation: Ar. Krauss et al., ION-BEAM DEPOSITION AND SURFACE CHARACTERIZATION OF THIN MULTICOMPONENT OXIDE-FILMS DURING GROWTH, Materials science & engineering. A, Structural materials: properties, microstructure and processing, 253(1-2), 1998, pp. 221-233
Authors:
SMENTKOWSKI VS
HOLECEK JC
SCHULTZ JA
KRAUSS AR
GRUEN DM
Citation: Vs. Smentkowski et al., USE OF REACTIVE ION SPUTTERING TO PRODUCE CLEAN GERMANIUM SURFACES INA CARBON-RICH ENVIRONMENT - AN ION-SCATTERING STUDY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(3), 1998, pp. 1779-1784
Authors:
AUCIELLO O
KRAUSS AR
IM J
SCHULTZ JA
Citation: O. Auciello et al., STUDIES OF MULTICOMPONENT OXIDE-FILMS AND LAYERED HETEROSTRUCTURE GROWTH-PROCESSES VIA IN-SITU, TIME-OF-FLIGHT ION-SCATTERING AND DIRECT RECOIL SPECTROSCOPY, Annual review of materials science, 28, 1998, pp. 375-396
Authors:
MICHAELIS A
IRENE EA
AUCIELLO O
KRAUSS AR
VEAL B
Citation: A. Michaelis et al., A SPECTROSCOPIC ANISOTROPY ELLIPSOMETRY STUDY OF YBA2CU3O7-X SUPERCONDUCTORS, Thin solid films, 313, 1998, pp. 362-367
Authors:
GOYETTE AN
LAWLER JE
ANDERSON LW
GRUEN DM
MCCAULEY TG
ZHOU D
KRAUSS AR
Citation: An. Goyette et al., SPECTROSCOPIC DETERMINATION OF CARBON DIMER DENSITIES IN AR-H-2-CH4 AND AR-H-2-C-60 PLASMAS, Journal of physics. D, Applied physics, 31(16), 1998, pp. 1975-1986
Authors:
ZHOU D
GRUEN DM
QIN LC
MCCAULEY TG
KRAUSS AR
Citation: D. Zhou et al., CONTROL OF DIAMOND FILM MICROSTRUCTURE BY AR ADDITIONS TO CH4 H-2 MICROWAVE PLASMAS/, Journal of applied physics, 84(4), 1998, pp. 1981-1989
Authors:
MICHAELIS A
IRENE EA
AUCIELLO O
KRAUSS AR
Citation: A. Michaelis et al., A STUDY OF OXYGEN DIFFUSION IN AND OUT OF YBA2CU3O7-DELTA THIN-FILMS, Journal of applied physics, 83(12), 1998, pp. 7736-7743
Authors:
ZHOU D
MCCAULEY TG
QIN LC
KRAUSS AR
GRUEN DM
Citation: D. Zhou et al., SYNTHESIS OF NANOCRYSTALLINE DIAMOND THIN-FILMS FROM AN AR-CH4 MICROWAVE PLASMA, Journal of applied physics, 83(1), 1998, pp. 540-543
Authors:
MCCAULEY TG
GRUEN DM
KRAUSS AR
Citation: Tg. Mccauley et al., TEMPERATURE-DEPENDENCE OF THE GROWTH-RATE FOR NANOCRYSTALLINE DIAMONDFILMS DEPOSITED FROM AN AR CH4 MICROWAVE PLASMA/, Applied physics letters, 73(12), 1998, pp. 1646-1648
Authors:
QIN LC
ZHOU D
KRAUSS AR
GRUEN DM
Citation: Lc. Qin et al., GROWING CARBON NANOTUBES BY MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Applied physics letters, 72(26), 1998, pp. 3437-3439
Authors:
IM J
KRAUSS AR
DHOTE AM
GRUEN DM
AUCIELLO O
RAMESH R
CHANG RPH
Citation: J. Im et al., STUDIES OF METALLIC SPECIES AND OXYGEN INCORPORATION DURING SPUTTER-DEPOSITION OF SRBI2TA2O9 FILMS, USING MASS-SPECTROSCOPY OF RECOILED IONS, Applied physics letters, 72(20), 1998, pp. 2529-2531
Authors:
KRAUSS AR
AUCIELLO O
IM J
SMENTKOWSKI V
GRUEN DM
IRENE EA
CHANG RPH
Citation: Ar. Krauss et al., STUDIES OF FERROELECTRIC FILM GROWTH-PROCESSES USING IN-SITU, REAL-TIME ION-BEAM ANALYSIS, Integrated ferroelectrics, 18(1-4), 1997, pp. 351-368
Authors:
ERDEMIR A
HALTER M
FENSKE GR
ZUIKER C
CSENCSITS R
KRAUSS AR
GRUEN DM
Citation: A. Erdemir et al., FRICTION AND WEAR MECHANISMS OF SMOOTH DIAMOND FILMS DURING SLIDING IN AIR AND DRY NITROGEN, Tribology transactions, 40(4), 1997, pp. 667-675
Authors:
ZHOU D
KRAUSS AR
QIN LC
MCCAULEY TG
GRUEN DM
CORRIGAN TD
CHANG RPH
GNASER H
Citation: D. Zhou et al., SYNTHESIS AND ELECTRON FIELD-EMISSION OF NANOCRYSTALLINE DIAMOND THIN-FILMS GROWN FROM N-2 CH4 MICROWAVE PLASMAS/, Journal of applied physics, 82(9), 1997, pp. 4546-4550
Authors:
ZHOU D
KRAUSS AR
GRUEN DM
Citation: D. Zhou et al., LOW-VOLTAGE ELECTRON-EMISSION FROM CALCIUM-CARBONATE WHISKERS COATED WITH A THIN-LAYER OF GOLD, Journal of applied physics, 82(8), 1997, pp. 4051-4054
Authors:
ZHOU D
KRAUSS AR
CORRIGAN TD
MCCAULEY TG
CHANG RPH
GRUEN DM
Citation: D. Zhou et al., MICROSTRUCTURE AND FIELD-EMISSION OF NANOCRYSTALLINE DIAMOND PREPAREDFROM C-60 PRECURSORS, Journal of the Electrochemical Society, 144(8), 1997, pp. 224-228
Authors:
WANG QH
CORRIGAN TD
DAI JY
CHANG RPH
KRAUSS AR
Citation: Qh. Wang et al., FIELD-EMISSION FROM NANOTUBE BUNDLE EMITTERS AT LOW FIELDS, Applied physics letters, 70(24), 1997, pp. 3308-3310
Authors:
DRUMMOND JL
STEINBERG AD
KRAUSS AR
Citation: Jl. Drummond et al., X-RAY PHOTOEMISSION AND ENERGY-DISPERSIVE SPECTROSCOPY OF HYDROXYAPATITE-COATED TITANIUM, Journal of the American Ceramic Society, 80(7), 1997, pp. 1868-1872
Authors:
ERDEMIR A
BINDAL C
FENSKE GR
ZUIKER C
KRAUSS AR
GRUEN DM
Citation: A. Erdemir et al., FRICTION AND WEAR PROPERTIES OF SMOOTH DIAMOND FILMS GROWN IN FULLERENE PLUS ARGON PLASMAS, DIAMOND AND RELATED MATERIALS, 5(9), 1996, pp. 923-931
IN-SITU ANALYSIS OF THIN-FILM DEPOSITION PROCESS USING TIME-OF-FLIGHT(TOF) ION-BEAM ANALYSIS-METHODS
Authors:
IM J
KRAUSS AR
LIN YP
SCHULTZ JA
AUCIELLO OH
GRUEN DM
CHANG RPH
Citation: J. Im et al., IN-SITU ANALYSIS OF THIN-FILM DEPOSITION PROCESS USING TIME-OF-FLIGHT(TOF) ION-BEAM ANALYSIS-METHODS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 118(1-4), 1996, pp. 772-781
Authors:
NISHINO Y
KRAUSS AR
LIN YP
GRUEN DM
Citation: Y. Nishino et al., INITIAL OXIDATION OF ZIRCONIUM AND ZIRCALOY-2 WITH OXYGEN AND WATER-VAPOR AT ROOM-TEMPERATURE, Journal of nuclear materials, 228(3), 1996, pp. 346-353
Authors:
ZUIKER CD
GRUEN DM
KRAUSS AR
Citation: Cd. Zuiker et al., IN-SITU LASER REFLECTANCE INTERFEROMETRY MEASUREMENT OF DIAMOND FILM GROWTH, Journal of applied physics, 79(7), 1996, pp. 3541-3547