Authors:
RAMUNGUL N
KHEMKA V
TYAGI R
CHOW TP
GHEZZO M
NEUDECK PG
KRETCHMER J
HENNESSY W
BROWN DM
Citation: N. Ramungul et al., COMPARISON OF ALUMINUM-IMPLANTED AND BORON-IMPLANTED VERTICAL 6H-SIC P+N JUNCTION DIODES, Solid-state electronics, 42(1), 1998, pp. 17-22
Authors:
GARDNER JA
EDWARDS A
RAO MV
PAPANICOLAOU N
KELNER G
HOLLAND OW
CAPANO MA
GHEZZO M
KRETCHMER J
Citation: Ja. Gardner et al., MATERIAL AND N-P JUNCTION PROPERTIES OF N-IMPLANATED, P-IMPLANTED, AND N P-IMPLANTED SIC/, Journal of applied physics, 83(10), 1998, pp. 5118-5124
Authors:
BROWN DM
DOWNEY E
GHEZZO M
KRETCHMER J
KRISHNAMURTHY V
HENNESY W
MICHON G
Citation: Dm. Brown et al., SILICON-CARBIDE MOSFET INTEGRATED-CIRCUIT TECHNOLOGY, Physica status solidi. a, Applied research, 162(1), 1997, pp. 459-479
Authors:
DWIGHT D
RAO MV
HOLLAND OW
KELNER G
CHI PH
KRETCHMER J
GHEZZO M
Citation: D. Dwight et al., NITROGEN AND ALUMINUM IMPLANTATION IN HIGH-RESISTIVITY SILICON-CARBIDE, Journal of applied physics, 82(11), 1997, pp. 5327-5333