Authors:
Duval, E
Soliman, L
Lheurette, E
Ketata, K
Benzohra, M
Duprat, C
Ketata, M
Citation: E. Duval et al., Rapid determination of "slow" states and "fast" states densities using thermally stimulated conductance spectroscopy on metal-oxide semiconductor capacitors, MAT SC S PR, 4(1-3), 2001, pp. 141-143
Authors:
Soliman, L
Duval, E
Benzohra, M
Lheurette, E
Ketata, K
Ketata, M
Citation: L. Soliman et al., Improvement of oxide thickness determination on MOS structures using capacitance-voltage measurements at high frequencies, MAT SC S PR, 4(1-3), 2001, pp. 163-166
Authors:
Dusch, A
Marcon, J
Masmoudi, K
Olivie, F
Benzohra, M
Ketata, K
Ketata, M
Citation: A. Dusch et al., Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation, MAT SCI E B, 80(1-3), 2001, pp. 65-67
Authors:
Duval, E
Lheurette, E
Ketata, K
Ketata, M
Citation: E. Duval et al., Determination of slow- and fast-state distributions using high-temperatureconductance spectroscopy on MOS structures, SEMIC SCI T, 16(10), 2001, pp. L57-L63
Authors:
Koumetz, S
Valet, O
Marcon, J
Ketata, K
Ketata, M
Citation: S. Koumetz et al., Beryllium diffusion in InGaAs/InGaAsP structures grown by gas source molecular beam epitaxy, MAT SCI E B, 71, 2000, pp. 171-174
Authors:
Koumetz, S
Ketata, K
Ihaddadene, M
Joubert, E
Ketata, M
Dubois, C
Citation: S. Koumetz et al., Be diffusion in InGaAs/InP heterostructures grown by gas source molecular beam epitaxy, J CRYST GR, 220(1-2), 2000, pp. 46-50
Authors:
Marcon, J
Koumetz, S
Ketata, K
Ketata, M
Caputo, JG
Citation: J. Marcon et al., A comprehensive study of beryllium diffusion in InGaAs using different forms of kick-out mechanism, EPJ-APPL PH, 8(1), 1999, pp. 7-18
Authors:
Ketata, M
Ketata, K
Koumetz, S
Marcon, J
Dubois, C
Citation: M. Ketata et al., The modeling of beryllium diffusion in InGaAsP layers grown by GSMBE undernonequilibrium conditions, EPJ-APPL PH, 8(1), 1999, pp. 19-24
Authors:
Koumetz, S
Marcon, J
Gautier, S
Ketata, K
Ketata, M
Dubois, C
Citation: S. Koumetz et al., Be diffusion in InGaAs, InGaAsP epitaxial layers and across InGaAs/InGaAsP, InGaAs/InP heterointerfaces, MAT SCI E B, 66(1-3), 1999, pp. 55-57
Authors:
Ketata, K
Ketata, M
Koumetz, S
Marcon, J
Valet, O
Citation: K. Ketata et al., Modeling the diffusion of Be in InGaAs/InGaAsP epitaxial heterostructures under non-equilibrium point defect conditions, PHYSICA B, 274, 1999, pp. 823-826
Authors:
Soliman, L
Benzohra, M
Masmoudi, M
Ketata, K
Boussaid, F
Martinez, A
Ketata, M
Citation: L. Soliman et al., Secondary defect profile related to low energy implanted boron measured upto 3.5 mu m depth into Si-substrates, J ELEC MAT, 28(12), 1999, pp. 1353-1357
Citation: K. Ketata et al., Beryllium diffusion mechanisms in InGaAs compounds grown by gas source molecular beam epitaxy, EUROPH LETT, 45(3), 1999, pp. 348-353
Authors:
Ketata, K
Ketata, M
Koumetz, S
Marcon, J
Masmoudi, M
Citation: K. Ketata et al., Modelling and simulation of beryllium diffusion in InGaAs compounds grown by gas source molecular beam epitaxy, MODEL SIM M, 6(6), 1998, pp. 747-753
Citation: S. Koumetz et al., A study of Be diffusion in InGaAsP layers grown by gas-source molecular beam epitaxy, J PHYS D, 31(24), 1998, pp. 3421-3427