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Results: 1-14 |
Results: 14
AUTOMATIC SYNTHESIS OF EQUIPMENT RECIPES FROM SPECIFIED WAFER-STATE TRANSITIONS
Authors: DAVIS JC MOZUMDER PK BURCH R FERNANDO C APTE PP SAXENA S RAO S VASANTH K
Citation: Jc. Davis et al., AUTOMATIC SYNTHESIS OF EQUIPMENT RECIPES FROM SPECIFIED WAFER-STATE TRANSITIONS, IEEE transactions on semiconductor manufacturing, 11(4), 1998, pp. 527-536
PLANNING WAFER ALLOCATION FOR CMOS PROCESS-DEVELOPMENT - A NONPARAMETRIC APPROACH
Authors: RAO S VASANTH K MOZUMDER PK SAXENA S DAVIS JC BURCH R
Citation: S. Rao et al., PLANNING WAFER ALLOCATION FOR CMOS PROCESS-DEVELOPMENT - A NONPARAMETRIC APPROACH, IEEE transactions on semiconductor manufacturing, 11(4), 1998, pp. 583-590
RECENT ADVANCES IN-PROCESS SYNTHESIS FOR SEMICONDUCTOR-DEVICES
Authors: HOSACK HH MOZUMDER PK POLLACK GP
Citation: Hh. Hosack et al., RECENT ADVANCES IN-PROCESS SYNTHESIS FOR SEMICONDUCTOR-DEVICES, I.E.E.E. transactions on electron devices, 45(3), 1998, pp. 626-633
GUEST EDITORIAL
Authors: MOZUMDER PK SAXENA S
Citation: Pk. Mozumder et S. Saxena, GUEST EDITORIAL, IEEE transactions on semiconductor manufacturing, 9(4), 1996, pp. 477-477
ADVANCED PROCESS-CONTROL OF A CVD TUNGSTEN REACTOR
Authors: STEFANI JA POARCH S SAXENA S MOZUMDER PK
Citation: Ja. Stefani et al., ADVANCED PROCESS-CONTROL OF A CVD TUNGSTEN REACTOR, IEEE transactions on semiconductor manufacturing, 9(3), 1996, pp. 366-383
A STATISTICAL METHODOLOGY AS APPLIED TO A 256 MBIT DRAM PASS TRANSISTOR DESIGN
Authors: MOZUMDER PK CHATTERJEE A
Citation: Pk. Mozumder et A. Chatterjee, A STATISTICAL METHODOLOGY AS APPLIED TO A 256 MBIT DRAM PASS TRANSISTOR DESIGN, IEEE transactions on semiconductor manufacturing, 9(3), 1996, pp. 437-446
SIMULTANEOUS CONTROL OF MULTIPLE MEASURES OF NONUNIFORMITY USING SITEMODELS AND MONITOR WAFER CONTROL
Authors: SAXENA S MOZUMDER PK TAYLOR KJ
Citation: S. Saxena et al., SIMULTANEOUS CONTROL OF MULTIPLE MEASURES OF NONUNIFORMITY USING SITEMODELS AND MONITOR WAFER CONTROL, IEEE transactions on semiconductor manufacturing, 9(1), 1996, pp. 128-135
SENSOR INTEGRATION INTO PLASMA ETCH REACTORS OF A DEVELOPMENTAL PILOTLINE
Authors: BARNA GG LOEWENSTEIN LM BRANKNER KJ BUTLER SW MOZUMDER PK STEFANI JA HENCK SA CHAPADOS P BUCK D MAUNG S SAXENA S UNRUH A
Citation: Gg. Barna et al., SENSOR INTEGRATION INTO PLASMA ETCH REACTORS OF A DEVELOPMENTAL PILOTLINE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2860-2867
A MONITOR WAFER BASED CONTROLLER FOR SEMICONDUCTOR PROCESSES
Authors: MOZUMDER PK SAXENA S COLLINS DJ
Citation: Pk. Mozumder et al., A MONITOR WAFER BASED CONTROLLER FOR SEMICONDUCTOR PROCESSES, IEEE transactions on semiconductor manufacturing, 7(3), 1994, pp. 400-411
SPECIAL ISSUE ON MICROELECTRONICS MANUFACTURING SCIENCE AND TECHNOLOGY
Authors: CHATTERJEE PK MOZUMDER PK
Citation: Pk. Chatterjee et Pk. Mozumder, SPECIAL ISSUE ON MICROELECTRONICS MANUFACTURING SCIENCE AND TECHNOLOGY, IEEE transactions on semiconductor manufacturing, 7(2), 1994, pp. 106-106
DOE OPT - A SYSTEM FOR DESIGN OF EXPERIMENTS, RESPONSE-SURFACE MODELING, AND OPTIMIZATION USING PROCESS AND DEVICE SIMULATION/
Authors: BONING DS MOZUMDER PK
Citation: Ds. Boning et Pk. Mozumder, DOE OPT - A SYSTEM FOR DESIGN OF EXPERIMENTS, RESPONSE-SURFACE MODELING, AND OPTIMIZATION USING PROCESS AND DEVICE SIMULATION/, IEEE transactions on semiconductor manufacturing, 7(2), 1994, pp. 233-244
STATISTICAL FEEDBACK-CONTROL OF A PLASMA ETCH PROCESS
Authors: MOZUMDER PK BARNA GG
Citation: Pk. Mozumder et Gg. Barna, STATISTICAL FEEDBACK-CONTROL OF A PLASMA ETCH PROCESS, IEEE transactions on semiconductor manufacturing, 7(1), 1994, pp. 1-11
SEMICONDUCTOR WAFER REPRESENTATION FOR TCAD
Authors: GILES MD BONING DS CHIN GR DIETRICH WC KARASICK MS LAW ME MOZUMDER PK NACKMAN LR RAJAN VT WALKER DMH WANG RH WONG AS
Citation: Md. Giles et al., SEMICONDUCTOR WAFER REPRESENTATION FOR TCAD, IEEE transactions on computer-aided design of integrated circuits and systems, 13(1), 1994, pp. 82-95
DRY ETCH PROCESSES AND SENSORS
Authors: BARNA GG LOEWENSTEIN LM HENCK SA CHAPADOS P BRANKNER KJ GALE RJ MOZUMDER PK BUTLER SW STEFANI JA
Citation: Gg. Barna et al., DRY ETCH PROCESSES AND SENSORS, Solid state technology, 37(1), 1994, pp. 47
Risultati: 1-14 |