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Results: 1-15 |
Results: 15

Authors: MORITA S UCHIHASHI T OKUSAKO T YAMANISHI Y OASA T SUGAWARA Y
Citation: S. Morita et al., STABILITY OF DENSELY CONTACT-ELECTRIFIED CHARGES ON THIN SILICON-OXIDE IN AIR, JPN J A P 1, 35(11), 1996, pp. 5811-5814

Authors: SUGAWARA Y TSUYUGUCHI T UCHIHASHI T OKUSAKO T FUKANO Y YAMANISHI Y OASA T MORITA S
Citation: Y. Sugawara et al., DENSITY SATURATION OF DENSELY CONTACT-ELECTRIFIED NEGATIVE CHARGES ONA THIN SILICON-OXIDE SAMPLE DUE TO THE COULOMB REPULSIVE FORCE, Philosophical magazine. A. Physics of condensed matter. Structure, defects and mechanical properties, 74(5), 1996, pp. 1339-1346

Authors: UCHIHASHI T OKUSAKO T SUGAWARA Y YAMANISHI Y OASA T MORITA S
Citation: T. Uchihashi et al., CORRELATION BETWEEN CONTACT-ELECTRIFIED CHARGE GROUPS ON A THIN SILICON-OXIDE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(2), 1996, pp. 1055-1059

Authors: UCHIHASHI T OKUSAKO T SUGAWARA Y YAMANISHI Y OASA T MORITA S
Citation: T. Uchihashi et al., PROXIMITY EFFECTS OF NEGATIVE CHARGE GROUPS CONTACT-ELECTRIFIED ON THIN SILICON-OXIDE IN AIR, Journal of applied physics, 79(8), 1996, pp. 4174-4177

Authors: FUKANO Y HONTANI KJ UCHIHASHI T OKUSAKO T CHAYAHARA A SUGAWARA Y YAMANISHI Y OASA T MORITA S
Citation: Y. Fukano et al., TIME-DEPENDENT DIELECTRIC-BREAKDOWN OF THIN SILICON-OXIDE USING DENSECONTACT ELECTRIFICATION, JPN J A P 1, 33(6B), 1994, pp. 3756-3760

Authors: FUKANO Y UCHIHASHI T OKUSAKO T CHAYAHARA A SUGAWARA Y YAMANISHI Y OASA T MORITA S
Citation: Y. Fukano et al., TIME EVOLUTION OF CONTACT-ELECTRIFIED ELECTRON DISSIPATION ON SILICON-OXIDE SURFACE INVESTIGATED USING NONCONTACT ATOMIC-FORCE MICROSCOPE, JPN J A P 1, 33(1B), 1994, pp. 379-382

Authors: FUKANO Y UCHIHASHI T OKUSAKO T CHAYAHARA A SUGAWARA Y YAMANISHI Y OASA T MORITA S
Citation: Y. Fukano et al., PARAMETER DEPENDENCE OF STABLE STATE OF DENSELY CONTACT-ELECTRIFIED ELECTRONS ON THIN SILICON-OXIDE, JPN J A P 1, 33(12A), 1994, pp. 6739-6745

Authors: UCHIHASHI T OKUSAKO T SUGAWARA Y YAMANISHI Y OASA T MORITA S
Citation: T. Uchihashi et al., HEAT-TREATMENT AND STEAMING EFFECTS OF SILICON-OXIDE UPON ELECTRON DISSIPATION ON SILICON-OXIDE SURFACE, JPN J A P 2, 33(8A), 1994, pp. 120001128-120001130

Authors: TSUYUGUCHI T UCHIHASHI T OKUSAKO T SUGAWARA Y MORITA S YAMANISHI Y OASA T
Citation: T. Tsuyuguchi et al., CONTACT ELECTRIFICATION ON THIN SILICON-OXIDE IN VACUUM, JPN J A P 2, 33(7B), 1994, pp. 120001046-120001048

Authors: SUGAWARA Y MORITA S FUKANO Y UCHIHASHI T OKUSAKO T CHAYAHARA A YAMANISHI Y OASA T
Citation: Y. Sugawara et al., SPATIAL-DISTRIBUTION AND ITS PHASE-TRANSITION OF DENSELY CONTACT-ELECTRIFIED ELECTRONS ON A THIN SILICON-OXIDE, JPN J A P 2, 33(1A), 1994, pp. 120000070-120000073

Authors: SUGAWARA Y MORITA S FUKANO Y UCHIHASHI T OKUSAKO T CHAYAHARA A YAMANISHI Y OASA T
Citation: Y. Sugawara et al., SPATIAL DISTRIBUTIONS OF DENSELY CONTACT-ELECTRIFIED CHARGES ON A THIN SILICON-OXIDE, JPN J A P 2, 33(1A), 1994, pp. 120000074-120000077

Authors: SUGAWARA Y FUKANO Y UCHIHASHI T OKUSAKO T MORITA S YAMANISHI Y OASA T OKADA T
Citation: Y. Sugawara et al., ATOMIC-FORCE MICROSCOPY STUDIES OF CONTACT-ELECTRIFIED CHARGES ON SILICON-OXIDE FILM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(3), 1994, pp. 1627-1630

Authors: MORITA S FUKANO Y UCHIHASHI T SUGAWARA Y YAMANISHI Y OASA T
Citation: S. Morita et al., DISSIPATION OF CONTACT-ELECTRIFIED CHARGE ON THIN SI-OXIDE STUDIED BYATOMIC-FORCE MICROSCOPY, Applied surface science, 75, 1994, pp. 151-156

Authors: MORITA S SUGAWARA Y FUKANO Y UCHIHASHI T OKUSAKO T CHAYAHARA A YAMANISHI Y OASA T
Citation: S. Morita et al., STABLE-UNSTABLE PHASE-TRANSITION OF DENSELY CONTRACT-ELECTRIFIED ELECTRONS ON THIN SILICON-OXIDE, JPN J A P 2, 32(12B), 1993, pp. 120001852-120001854

Authors: MORITA S FUKANO Y UCHIHASHI T OKUSAKO T SUGAWARA Y YAMANISHI Y OASA T
Citation: S. Morita et al., REPRODUCIBLE AND CONTROLLABLE CONTACT ELECTRIFICATION ON A THIN INSULATOR, JPN J A P 2, 32(11B), 1993, pp. 120001701-120001703
Risultati: 1-15 |