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Results: 1-22 |
Results: 22
Electron attachment cross sections and negative ion states of SF6
Authors: Christophorou, LG Olthoff, JK
Citation: Lg. Christophorou et Jk. Olthoff, Electron attachment cross sections and negative ion states of SF6, INT J MASS, 205(1-3), 2001, pp. 27-41
Electron collision data for plasma-processing gases
Authors: Christophorou, LG Olthoff, JK
Citation: Lg. Christophorou et Jk. Olthoff, Electron collision data for plasma-processing gases, ADV ATOM MO, 44, 2001, pp. 59-98
Electron interactions with excited atoms and molecules
Authors: Christophorou, LG Olthoff, JK
Citation: Lg. Christophorou et Jk. Olthoff, Electron interactions with excited atoms and molecules, ADV ATOM MO, 44, 2001, pp. 155-293
Ion compositions and energies in inductively coupled plasmas containing SF6
Authors: Goyette, AN Wang, YC Olthoff, JK
Citation: An. Goyette et al., Ion compositions and energies in inductively coupled plasmas containing SF6, J VAC SCI A, 19(4), 2001, pp. 1294-1297
Electron interactions with c-C4F8
Authors: Christophorou, LG Olthoff, JK
Citation: Lg. Christophorou et Jk. Olthoff, Electron interactions with c-C4F8, J PHYS CH R, 30(2), 2001, pp. 449-473
Electron transport, ionization, and attachment coefficients in C2F4 and C2F4/Ar mixtures
Authors: Goyette, AN de Urquijo, J Wang, YC Christophorou, LG Olthoff, JK
Citation: An. Goyette et al., Electron transport, ionization, and attachment coefficients in C2F4 and C2F4/Ar mixtures, J CHEM PHYS, 114(20), 2001, pp. 8932-8937
Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 and c-C4F8
Authors: Goyette, AN Wang, YC Misakian, M Olthoff, JK
Citation: An. Goyette et al., Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 and c-C4F8, J VAC SCI A, 18(6), 2000, pp. 2785-2790
Electron interactions with CF3I
Authors: Christophorou, LG Olthoff, JK
Citation: Lg. Christophorou et Jk. Olthoff, Electron interactions with CF3I, J PHYS CH R, 29(4), 2000, pp. 553-569
Electron interactions with SF6
Authors: Christophorou, LG Olthoff, JK
Citation: Lg. Christophorou et Jk. Olthoff, Electron interactions with SF6, J PHYS CH R, 29(3), 2000, pp. 267-330
Inductively coupled plasmas in low global-warming-potential gases
Authors: Goyette, AN Wang, YC Olthoff, JK
Citation: An. Goyette et al., Inductively coupled plasmas in low global-warming-potential gases, J PHYS D, 33(16), 2000, pp. 2004-2009
Ion fluxes and energies in inductively coupled radio-frequency discharges containing CHF3
Authors: Wang, YC Misakian, M Goyette, AN Olthoff, JK
Citation: Yc. Wang et al., Ion fluxes and energies in inductively coupled radio-frequency discharges containing CHF3, J APPL PHYS, 88(10), 2000, pp. 5612-5617
Time-resolved measurements of ion energy distributions and optical emissions in pulsed radio-frequency discharges
Authors: Wang, YC Benck, EC Misakian, M Edamura, M Olthoff, JK
Citation: Yc. Wang et al., Time-resolved measurements of ion energy distributions and optical emissions in pulsed radio-frequency discharges, J APPL PHYS, 87(5), 2000, pp. 2114-2121
Ion-molecule reactions and ion energies in a CF4 discharge
Authors: Peko, BL Dyakov, IV Champion, RL Rao, MVVS Olthoff, JK
Citation: Bl. Peko et al., Ion-molecule reactions and ion energies in a CF4 discharge, PHYS REV E, 60(6), 1999, pp. 7449-7456
Kinetic-energy distributions of positive and negative ions in Townsend discharges in oxygen
Authors: Rao, MVVS Van Brunt, RJ Olthoff, JK
Citation: Mvvs. Rao et al., Kinetic-energy distributions of positive and negative ions in Townsend discharges in oxygen, PHYS REV E, 59(4), 1999, pp. 4565-4572
Studies of ion bombardment in high density plasmas containing CF4
Authors: Olthoff, JK Wang, YC
Citation: Jk. Olthoff et Yc. Wang, Studies of ion bombardment in high density plasmas containing CF4, J VAC SCI A, 17(4), 1999, pp. 1552-1555
Electron interactions with plasma processing gases: An update for CF4, CHF3, C2F6, and C3F8
Authors: Christophorou, LG Olthoff, JK
Citation: Lg. Christophorou et Jk. Olthoff, Electron interactions with plasma processing gases: An update for CF4, CHF3, C2F6, and C3F8, J PHYS CH R, 28(4), 1999, pp. 967-982
Electron interactions with Cl-2
Authors: Christophorou, LG Olthoff, JK
Citation: Lg. Christophorou et Jk. Olthoff, Electron interactions with Cl-2, J PHYS CH R, 28(1), 1999, pp. 131-169
Total electron scattering cross section for Cl-2
Authors: Cooper, GD Sanabia, JE Moore, JH Olthoff, JK Christophorou, LG
Citation: Gd. Cooper et al., Total electron scattering cross section for Cl-2, J CHEM PHYS, 110(1), 1999, pp. 682-683
Boltzmann analysis of electron swarm parameters in CF4 using independentlyassessed electron-collision cross sections
Authors: Bordage, MC Segur, P Christophorou, LG Olthoff, JK
Citation: Mc. Bordage et al., Boltzmann analysis of electron swarm parameters in CF4 using independentlyassessed electron-collision cross sections, J APPL PHYS, 86(7), 1999, pp. 3558-3566
Ion energy distributions in inductively coupled radio-frequency dischargesin argon, nitrogen, oxygen, chlorine, and their mixtures
Authors: Wang, Y Olthoff, JK
Citation: Y. Wang et Jk. Olthoff, Ion energy distributions in inductively coupled radio-frequency dischargesin argon, nitrogen, oxygen, chlorine, and their mixtures, J APPL PHYS, 85(9), 1999, pp. 6358-6365
Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor
Authors: Sobolewski, MA Olthoff, JK Wang, YC
Citation: Ma. Sobolewski et al., Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor, J APPL PHYS, 85(8), 1999, pp. 3966-3975
Electron drift and attachment in CHF3 and its mixtures with argon
Authors: Wang, YC Christophorou, LG Olthoff, JK Verbrugge, JK
Citation: Yc. Wang et al., Electron drift and attachment in CHF3 and its mixtures with argon, CHEM P LETT, 304(5-6), 1999, pp. 303-308
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