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Schwegler, V
Schad, SS
Scherer, M
Kamp, M
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Hahne, B
Lugauer, HJ
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Weimar, A
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Citation: V. Schwegler et al., GaN-based lasers on SiC: influence of mirror reflectivity on L-I characteristics, J CRYST GR, 230(3-4), 2001, pp. 512-516
Authors:
Rotter, T
Mistele, D
Stemmer, J
Seyboth, M
Schwegler, V
Paprotta, S
Fedler, F
Klausing, H
Semchinova, OK
Aderhold, J
Graul, J
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Authors:
Fischer, P
Christen, J
Zacharias, M
Schwegler, V
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Kamp, M
Citation: P. Fischer et al., Spatially resolved imaging of the spectral emission characteristic of an InGaN/GaN-multi quantum well- light-emitting diode by scanning electroluminescence microscopy, JPN J A P 1, 39(4B), 2000, pp. 2414-2416
Authors:
Rotter, T
Mistele, D
Stemmer, J
Fedler, F
Aderhold, J
Graul, J
Schwegler, V
Kirchner, C
Kamp, M
Heuken, M
Citation: T. Rotter et al., Photoinduced oxide film formation on n-type GaN surfaces using alkaline solutions, APPL PHYS L, 76(26), 2000, pp. 3923-3925
Authors:
Kornitzer, G
Grehl, M
Thonke, K
Sauer, R
Kirchner, C
Schwegler, V
Kamp, M
Leszczynski, M
Grzegory, I
Porowski, S
Citation: G. Kornitzer et al., High-resolution PL spectra of donor- and acceptor-bound excitons in homoepitaxial GaN-layers, PHYSICA B, 274, 1999, pp. 66-69
Authors:
Kornitzer, K
Ebner, T
Grehl, M
Thonke, K
Sauer, R
Kirchner, C
Schwegler, V
Kamp, M
Leszczynski, M
Grzegory, I
Porowski, S
Citation: K. Kornitzer et al., High-resolution photoluminescence and reflectance spectra of homoepitaxialGaN layers, PHYS ST S-B, 216(1), 1999, pp. 5-9
Authors:
Kornitzer, K
Ebner, T
Thonke, K
Sauer, R
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Schwegler, V
Kamp, M
Leszczynski, M
Grzegory, I
Porowski, S
Citation: K. Kornitzer et al., Photoluminescence and reflectance spectroscopy of excitonic transitions inhigh-quality homoepitaxial GaN films, PHYS REV B, 60(3), 1999, pp. 1471-1473
Authors:
Fischer, P
Christen, J
Zacharias, M
Schwegler, V
Kirchner, C
Kamp, M
Citation: P. Fischer et al., Scanning electroluminescence microscopy: A powerful novel characterizationtool for light emitting diodes, PHYS ST S-A, 176(1), 1999, pp. 119-123
Authors:
Schwegler, V
Schad, SS
Kirchner, C
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Kamp, M
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Turkin, AN
Yunovich, AE
Stempfle, U
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Sauer, R
Citation: V. Schwegler et al., Ohmic heating of InGaN LEDs during operation: Determination of the junction temperature and its influence on device performance, PHYS ST S-A, 176(1), 1999, pp. 783-786
Authors:
Kirchner, C
Schwegler, V
Eberhard, F
Kamp, M
Ebeling, KJ
Kornitzer, K
Ebner, T
Thonke, K
Sauer, R
Prystawko, P
Leszczynski, M
Grzegory, I
Porowski, S
Citation: C. Kirchner et al., Homoepitaxial growth of GaN by metalorganic vapor phase epitaxy: A benchmark for GaN technology, APPL PHYS L, 75(8), 1999, pp. 1098-1100
Authors:
Fischer, P
Christen, J
Zacharias, M
Schwegler, V
Kirchner, C
Kamp, M
Citation: P. Fischer et al., Direct imaging of the spectral emission characteristic of an InGaN/GaN-ultraviolet light-emitting diode by highly spectrally and spatially resolved electroluminescence and photoluminescence microscopy, APPL PHYS L, 75(22), 1999, pp. 3440-3442
Authors:
Schauler, M
Eberhard, F
Kirchner, C
Schwegler, V
Pelzmann, A
Kamp, M
Ebeling, KJ
Bertram, F
Riemann, T
Christen, J
Prystawko, P
Leszczynski, M
Grzegory, I
Porowski, S
Citation: M. Schauler et al., Dry etching of GaN substrates for high-quality homoepitaxy, APPL PHYS L, 74(8), 1999, pp. 1123-1125