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Results: 1-25/29
Authors:
FEDER KS
TENNANT DM
Citation: Ks. Feder et Dm. Tennant, SIMPLE TECHNIQUE FOR MEASURING GRATING PERIODS MADE USING E-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(4), 1998, pp. 2113-2114
Authors:
RAYBON G
KOREN U
MILLER BI
CHIEN M
DREYER K
CHANDRASEKHAR S
BEHRINGER RE
TENNANT DM
FEDER K
Citation: G. Raybon et al., RECONFIGURABLE OPTOELECTRONIC WAVELENGTH TRANSLATION BASED ON AN INTEGRATED ELECTROABSORPTION MODULATED LASER ARRAY, IEEE photonics technology letters, 10(2), 1998, pp. 215-217
Authors:
LIDDLE JA
BLAKEY MI
SAUNDERS T
FARROW RC
FETTER LA
KNUREK CS
KASICA R
NOVEMBRE AE
PEABODY ML
TENNANT DM
WINDT DL
POSTEK M
Citation: Ja. Liddle et al., METROLOGY OF SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2197-2203
Authors:
WOOD OR
WHITE DL
BJORKHOLM JE
FETTER LE
TENNANT DM
MACDOWELL AA
LAFONTAINE B
KUBIAK GD
Citation: Or. Wood et al., USE OF ATTENUATED PHASE MASKS IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2448-2451
Authors:
SPECTOR SJ
JACOBSEN CJ
TENNANT DM
Citation: Sj. Spector et al., PROCESS OPTIMIZATION FOR PRODUCTION OF SUB-20 NM SOFT-X-RAY ZONE PLATES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2872-2876
Authors:
AHRENS RG
TENNANT DM
Citation: Rg. Ahrens et Dm. Tennant, RESIST PROFILE ENHANCEMENT IN NEAR-FIELD HOLOGRAPHIC PRINTING USING BOTTOM ANTIREFLECTION COATINGS, Microelectronic engineering, 35(1-4), 1997, pp. 229-234
Authors:
BEHRINGER RE
NATARAJAN V
TIMP G
TENNANT DM
Citation: Re. Behringer et al., LIMIT OF RESOLUTION OF A STANDING-WAVE ATOM OPTICAL LENS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4072-4075
Authors:
NGUYEN KB
CARDINALE GF
TICHENOR DA
KUBIAK GD
BERGER K
RAYCHAUDHURI AK
PERRAS Y
HANEY SJ
NISSEN R
KRENZ K
STULEN RH
FUJIOKA H
HU C
BOKOR J
TENNANT DM
FETTER LA
Citation: Kb. Nguyen et al., FABRICATION OF METAL-OXIDE-SEMICONDUCTOR DEVICES WITH EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4188-4192
Authors:
TENNANT DM
KOCH TL
Citation: Dm. Tennant et Tl. Koch, FABRICATION AND UNIFORMITY ISSUES IN LAMBDA 4 SHIFTED DFB LASER ARRAYS USING E-BEAM GENERATED CONTACT GRATING MASKS/, Microelectronic engineering, 32(1-4), 1996, pp. 331-350
Authors:
NATARAJAN V
BEHRINGER RE
TENNANT DM
TIMP G
Citation: V. Natarajan et al., NANOLITHOGRAPHY USING A LASER FOCUSED NEUTRAL ATOM BEAM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2823-2827
Authors:
BJORKHOLM JE
MACDOWELL AA
WOOD OR
TAN Z
LAFONTAINE B
TENNANT DM
Citation: Je. Bjorkholm et al., PHASE-MEASURING INTERFEROMETRY USING EXTREME-ULTRAVIOLET RADIATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2919-2922
Authors:
NGUYEN KB
RAYCHAUDHURI AK
STULEN RH
KRENZ K
FETTER LA
TENNANT DM
WINDT DL
Citation: Kb. Nguyen et al., PRINTABILITY OF SUBSTRATE AND ABSORBER DEFECTS ON EXTREME-ULTRAVIOLETLITHOGRAPHIC MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3082-3088
Authors:
TENNANT DM
FEDER K
DREYER KF
GNALL RP
KOCH TL
KOREN U
MILLER BI
YOUNG MG
Citation: Dm. Tennant et al., PHASE GRATING MASKS FOR PHOTONIC INTEGRATED-CIRCUITS FABRICATED BY E-BEAM WRITING AND DRY-ETCHING - CHALLENGES TO COMMERCIAL APPLICATIONS, Microelectronic engineering, 27(1-4), 1995, pp. 427-437
Authors:
YOUNG MG
KOREN U
MILLER BI
CHIEN M
KOCH TL
TENNANT DM
FEDER K
DREYER K
RAYBON G
Citation: Mg. Young et al., 6-WAVELENGTH LASER ARRAY WITH INTEGRATED AMPLIFIER AND MODULATOR, Electronics Letters, 31(21), 1995, pp. 1835-1836
Authors:
YOUNG MG
KOCH TL
KOREN U
TENNANT DM
MILLER BI
CHIEN M
FEDER K
Citation: Mg. Young et al., WAVELENGTH UNIFORMITY IN LAMBDA 4 SHIFTED DFB LASER ARRAY WDM TRANSMITTERS/, Electronics Letters, 31(20), 1995, pp. 1750-1752
Authors:
LAFONTAINE B
MACDOWELL AA
TAN ZQ
WHITE DL
TAYLOR GN
WOOD OR
BJORKHOLM JE
TENNANT DM
HULBERT SL
Citation: B. Lafontaine et al., SUBMICRON, SOFT-X-RAY FLUORESCENCE IMAGING, Applied physics letters, 66(3), 1995, pp. 282-284
Authors:
LAFONTAINE B
WHITE DL
WOOD OR
MACDOWELL AA
TAN ZQ
TAYLOR GN
TENNANT DM
HULBERT SL
Citation: B. Lafontaine et al., REAL-TIME OBSERVATIONS OF EXTREME-ULTRAVIOLET AERIAL IMAGES BY FLUORESCENCE MICROIMAGING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3576-3579
Authors:
TENNANT DM
DREYER KF
FEDER K
GNALL RP
KOCH TL
KOREN U
MILLER BI
VARTULI C
YOUNG MG
Citation: Dm. Tennant et al., ADVANCES IN NEAR-FIELD HOLOGRAPHIC GRATING MASK TECHNOLOGY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3689-3694
Authors:
KUBIAK GD
TICHENOR DA
RAYCHAUDHURI AK
MALINOWSKI ME
STULEN RH
HANEY SJ
BERGER KW
NISSEN RP
WILKERSON GA
PAUL PH
BJORKHOLM JE
FETTER LA
FREEMAN RR
HIMEL MD
MACDOWELL AA
TENNANT DM
WOOD OR
WASKIEWICZ WK
WHITE DL
WINDT DL
JEWELL TE
Citation: Gd. Kubiak et al., CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3820-3825
Authors:
WOOD OR
BJORKHOLM JE
FETTER L
HIMEL MD
TENNANT DM
MACDOWELL AA
LAFONTAINE B
GRIFFITH JE
TAYLOR GN
WASKIEWICZ WK
WINDT DL
KORTRIGHT JB
GULLIKSON EK
NGUYEN K
Citation: Or. Wood et al., WAVELENGTH DEPENDENCE OF THE RESIST SIDEWALL ANGLE IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3841-3845
Authors:
SPECTOR SJ
TENNANT DM
TAN Z
BJORKHOLM JE
Citation: Sj. Spector et al., FABRICATION OF DIFFRACTIVE OPTICAL-COMPONENTS FOR AN EXTREME-ULTRAVIOLET SHEARING INTERFEROMETER, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3846-3850
Authors:
TENNANT DM
KOCH TL
VERDIELL JM
FEDER K
GNALL RP
KOREN U
YOUNG MG
MILLER BI
NEWKIRK MA
TELL B
Citation: Dm. Tennant et al., MULTIWAVELENGTH DISTRIBUTED-BRAGG-REFLECTOR LASER ARRAY FABRICATED USING NEAR-FIELD HOLOGRAPHIC PRINTING WITH AN ELECTRON-BEAM GENERATED PHASE GRATING MASK, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2509-2513
Authors:
EARLY K
WINDT DL
WASKIEWICZ WK
WOOD OR
TENNANT DM
Citation: K. Early et al., REPAIR OF SOFT-X-RAY OPTICAL-ELEMENTS BY STRIPPING AND REDEPOSITION OF MO SI REFLECTIVE COATINGS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2926-2929
Authors:
VERDIELL JM
KOCH TL
TENNANT DM
FEDER K
GNALL RP
YOUNG MG
MILLER BI
KOREN U
NEWKIRK MA
TELL B
Citation: Jm. Verdiell et al., 8-WAVELENGTH DBR LASER ARRAY FABRICATED WITH A SINGLE-STEP BRAGG GRATING PRINTING TECHNIQUE, IEEE photonics technology letters, 5(6), 1993, pp. 619-621
Authors:
TENNANT DM
FETTER LA
HARRIOTT LR
MACDOWELL AA
MULGREW PP
PASTALAN JZ
WASKIEWICZ WK
WINDT DL
WOOD OR
Citation: Dm. Tennant et al., MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM, Applied optics, 32(34), 1993, pp. 7007-7011