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Results:
1-12
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Results: 12
Authors:
Rosental, A
Tarre, A
Gerst, A
Uustare, T
Sammelselg, V
Citation: A. Rosental et al., Atomic-layer chemical Vapor deposition of SnO2 for gas-sensing applications, SENS ACTU-B, 77(1-2), 2001, pp. 297-300
Authors:
Kukli, K
Aarik, J
Aidla, A
Forsgren, K
Sundqvist, J
Harsta, A
Uustare, T
Mandar, H
Kiisler, AA
Citation: K. Kukli et al., Atomic layer deposition of tantalum oxide thin films from iodide precursor, CHEM MATER, 13(1), 2001, pp. 122-128
Authors:
Aarik, J
Karlis, J
Mandar, H
Uustare, T
Sammelselg, V
Citation: J. Aarik et al., Influence of structure development on atomic layer deposition of TiO2 thinfilms, APPL SURF S, 181(3-4), 2001, pp. 339-348
Authors:
Tarre, A
Rosental, A
Sammelselg, V
Uustare, T
Citation: A. Tarre et al., Comparative study of low-temperature chloride atomic-layer chemical vapor deposition of TiO2 and SnO2, APPL SURF S, 175, 2001, pp. 111-116
Authors:
Aarik, J
Aidla, A
Mandar, H
Uustare, T
Kukli, K
Schuisky, M
Citation: J. Aarik et al., Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures, APPL SURF S, 173(1-2), 2001, pp. 15-21
Authors:
Aarik, J
Aidla, A
Mandar, H
Uustare, T
Citation: J. Aarik et al., Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism, APPL SURF S, 172(1-2), 2001, pp. 148-158
Authors:
Kukli, K
Forsgren, K
Aarik, J
Uustare, T
Aidla, A
Niskanen, A
Ritala, M
Leskela, M
Harsta, A
Citation: K. Kukli et al., Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide, J CRYST GR, 231(1-2), 2001, pp. 262-272
Authors:
Kukli, K
Ritala, M
Schuisky, M
Leskela, M
Sajavaara, T
Keinonen, J
Uustare, T
Harsta, A
Citation: K. Kukli et al., Atomic layer deposition of titanium oxide from TiI4 and H2O2, CHEM VAPOR, 6(6), 2000, pp. 303-310
Authors:
Aarik, J
Aidla, A
Uustare, T
Ritala, M
Leskela, M
Citation: J. Aarik et al., Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process, APPL SURF S, 161(3-4), 2000, pp. 385-395
Authors:
Aarik, J
Aidla, A
Sammelselg, V
Uustare, T
Ritala, M
Leskela, M
Citation: J. Aarik et al., Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water, THIN SOL FI, 370(1-2), 2000, pp. 163-172
Authors:
Aarik, J
Aidla, A
Mandar, H
Sammelselg, V
Uustare, T
Citation: J. Aarik et al., Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition, J CRYST GR, 220(1-2), 2000, pp. 105-113
Authors:
Aarik, J
Aidla, A
Kiisler, AA
Uustare, T
Sammelselg, V
Citation: J. Aarik et al., Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films, THIN SOL FI, 340(1-2), 1999, pp. 110-116
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