Citation: Sb. Wang et Pr. Zhu, Effects of forming cavities on the lattice quality and carrier profile in the B doped silicon, MAT SCI E B, 72(2-3), 2000, pp. 142-145
Citation: Sb. Wang et al., Preferential growth of C54TiSi(2) by metal vapor vacuum arc ion source implantation and post-annealing, SURF COAT, 131(1-3), 2000, pp. 84-87
Citation: Sb. Wang et al., The microstructure and tribological properties of copper surfaces implanted with carbon ions, SURF COAT, 123(2-3), 2000, pp. 173-176
Citation: Sb. Wang et al., Influences of H+ implantation on the boron-doped synthesized by chemical vapor deposition diamond films, CHIN PHYS L, 17(9), 2000, pp. 686-688
Citation: Sb. Wang et al., Characteristics of CrSi2 and Cr(Ni)Si-2 synthesis in MEVVA ion source implantation and post-annealing processes, APPL SURF S, 153(2-3), 2000, pp. 108-113
Citation: Sb. Wang et Pr. Zhu, The formation of Ti-silicides by a metal vapour vacuum are ion source implantation and annealing process, VACUUM, 59(4), 2000, pp. 919-926
Citation: Sb. Wang et al., Epitaxial growth of alloy Cr(Ni)Si-2 by metal vapour vacuum are ion sourceimplantation and post-annealing, VACUUM, 56(2), 2000, pp. 95-99
Citation: Sb. Wang et al., The growth and thermal stability of Ti-silicides obtained by metal vapor vacuum arc ion source implantation, PHYS ST S-A, 179(1), 2000, pp. 95-101
Authors:
Zhu, PR
Yamamoto, S
Miyashita, A
Wu, ZP
Narumi, K
Naramoto, H
Citation: Pr. Zhu et al., Semiconductor-metal phase transition in VO2 films synthesized on alpha-Al2O3 by oxygen-reactive deposition using a neodymium-doped yttrium aluminium garnet laser, PHIL MAG L, 79(8), 1999, pp. 603-608
Citation: Hx. Zhang et al., The effect of boron ion implantation and annealing on the microstructure and electrical characteristics of the diamond films, APPL SURF S, 150(1-4), 1999, pp. 43-46
Authors:
Dai, ZN
Zhu, PR
Yamamoto, S
Miyashita, A
Narum, K
Naramoto, H
Citation: Zn. Dai et al., Pulsed laser deposition of ilmenite FeTiO3 epitaxial thin film onto sapphire substrate, THIN SOL FI, 339(1-2), 1999, pp. 114-116