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Results: 1-24 |
Results: 24
PERFORMANCE OF ZR O/W SCHOTTKY EMITTERS AT REDUCED TEMPERATURES/
Authors: KIM HS YU ML THOMSON MGR KRATSCHMER E CHANG THP
Citation: Hs. Kim et al., PERFORMANCE OF ZR O/W SCHOTTKY EMITTERS AT REDUCED TEMPERATURES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2284-2288
MINIMUM EMISSION CURRENT OF LIQUID-METAL ION SOURCES
Authors: BECKMAN JC CHANG THP WAGNER A PEASE RFW
Citation: Jc. Beckman et al., MINIMUM EMISSION CURRENT OF LIQUID-METAL ION SOURCES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2332-2336
ENERGY-DISTRIBUTIONS OF ZR O/W SCHOTTKY ELECTRON-EMISSION/
Authors: KIM HS YU ML THOMSON MGR KRATSCHMER E CHANG THP
Citation: Hs. Kim et al., ENERGY-DISTRIBUTIONS OF ZR O/W SCHOTTKY ELECTRON-EMISSION/, Journal of applied physics, 81(1), 1997, pp. 461-465
ELECTRON-BEAM MICROCOLUMNS FOR LITHOGRAPHY AND RELATED APPLICATIONS
Authors: CHANG THP THOMSON MGR KRATSCHMER E KIM HS YU ML LEE KY RISHTON SA HUSSEY BW ZOLGHARNAIN S
Citation: Thp. Chang et al., ELECTRON-BEAM MICROCOLUMNS FOR LITHOGRAPHY AND RELATED APPLICATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3774-3781
EXPERIMENTAL EVALUATION OF A 20X20 MM FOOTPRINT MICROCOLUMN
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML ZOLGHARNAIN S HUSSEY BW CHANG THP
Citation: E. Kratschmer et al., EXPERIMENTAL EVALUATION OF A 20X20 MM FOOTPRINT MICROCOLUMN, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3792-3796
ENERGY-DISTRIBUTIONS OF FIELD EMITTED ELECTRONS FROM CARBIDE TIPS ANDTUNGSTEN TIPS WITH DIAMOND-LIKE CARBON COATINGS
Authors: YU ML KIM HS HUSSEY BW CHANG THP MACKIE WA
Citation: Ml. Yu et al., ENERGY-DISTRIBUTIONS OF FIELD EMITTED ELECTRONS FROM CARBIDE TIPS ANDTUNGSTEN TIPS WITH DIAMOND-LIKE CARBON COATINGS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3797-3801
HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY USING ZEP-520 AND KRS RESISTS AT LOW-VOLTAGE
Authors: TANENBAUM DM LO CW ISAACSON M CRAIGHEAD HG ROOKS MJ LEE KY HUANG WS CHANG THP
Citation: Dm. Tanenbaum et al., HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY USING ZEP-520 AND KRS RESISTS AT LOW-VOLTAGE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3829-3833
ENERGY SPREAD IN LIQUID-METAL ION SOURCES AT LOW CURRENTS
Authors: BECKMAN JC CHANG THP WAGNER A PEASE RFW
Citation: Jc. Beckman et al., ENERGY SPREAD IN LIQUID-METAL ION SOURCES AT LOW CURRENTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3911-3915
ELECTRON-BEAM TECHNOLOGY - SEM TO MICROCOLUMN
Authors: CHANG THP THOMSON MGR YU ML KRATSCHMER E KIM HS LEE KY RISHTON SA ZOLGHARNAIN S
Citation: Thp. Chang et al., ELECTRON-BEAM TECHNOLOGY - SEM TO MICROCOLUMN, Microelectronic engineering, 32(1-4), 1996, pp. 113-130
MICROCOLUMN BASED LOW-ENERGY E-BEAM WRITING
Authors: STEBLER C DESPONT M STAUFER U CHANG THP LEE KY RISHTON SA
Citation: C. Stebler et al., MICROCOLUMN BASED LOW-ENERGY E-BEAM WRITING, Microelectronic engineering, 30(1-4), 1996, pp. 45-48
NEW EVIDENCE FOR LOCALIZED ELECTRONIC STATES ON ATOMICALLY SHARP FIELD EMITTERS
Authors: YU ML LANG ND HUSSEY BW CHANG THP MACKIE WA
Citation: Ml. Yu et al., NEW EVIDENCE FOR LOCALIZED ELECTRONIC STATES ON ATOMICALLY SHARP FIELD EMITTERS, Physical review letters, 77(8), 1996, pp. 1636-1639
IMPROVED EMISSION STABILITY OF CARBURIZED HFC[100] AND ULTRASHARP TUNGSTEN FIELD EMITTERS
Authors: YU ML HUSSEY BW KRATSCHMER E CHANG THP MACKIE WA
Citation: Ml. Yu et al., IMPROVED EMISSION STABILITY OF CARBURIZED HFC[100] AND ULTRASHARP TUNGSTEN FIELD EMITTERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2436-2440
LENS AND DEFLECTOR DESIGN FOR MICROCOLUMNS
Authors: THOMSON MGR CHANG THP
Citation: Mgr. Thomson et Thp. Chang, LENS AND DEFLECTOR DESIGN FOR MICROCOLUMNS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2445-2449
MINIATURE SCHOTTKY ELECTRON SOURCE
Authors: KIM HS YU ML KRATSCHMER E HUSSEY BW THOMSON MGR CHANG THP
Citation: Hs. Kim et al., MINIATURE SCHOTTKY ELECTRON SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2468-2472
AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT, AND STABILITY
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML CHANG THP
Citation: E. Kratschmer et al., AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT, AND STABILITY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2498-2503
CHARACTERIZATION OF A GAAS METAL-SEMICONDUCTOR-METAL LOW-ENERGY-ELECTRON DETECTOR
Authors: ZOLGHARNAIN S LEE KY RISHTON SA KISKER D CHANG THP
Citation: S. Zolgharnain et al., CHARACTERIZATION OF A GAAS METAL-SEMICONDUCTOR-METAL LOW-ENERGY-ELECTRON DETECTOR, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2556-2560
MINIATURE 3-AXIS MICROPOSITIONER FOR SCANNING PROXIMAL PROBE AND OTHER APPLICATIONS
Authors: KLEINDIEK S KIM HS KRATSCHMER E CHANG THP
Citation: S. Kleindiek et al., MINIATURE 3-AXIS MICROPOSITIONER FOR SCANNING PROXIMAL PROBE AND OTHER APPLICATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2653-2656
MICROMACHINING APPLICATIONS OF A HIGH-RESOLUTION ULTRATHICK PHOTORESIST
Authors: LEE KY LABIANCA N RISHTON SA ZOLGHARNAIN S GELORME JD SHAW J CHANG THP
Citation: Ky. Lee et al., MICROMACHINING APPLICATIONS OF A HIGH-RESOLUTION ULTRATHICK PHOTORESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3012-3016
EVALUATION OF ZR O/W SCHOTTKY EMITTERS FOR MICROCOLUMN APPLICATIONS/
Authors: KIM HS KRATSCHMER E YU ML THOMSON MGR CHANG THP
Citation: Hs. Kim et al., EVALUATION OF ZR O/W SCHOTTKY EMITTERS FOR MICROCOLUMN APPLICATIONS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3413-3417
HIGH-ASPECT-RATIO ALIGNED MULTILAYER MICROSTRUCTURE FABRICATION
Authors: LEE KY RISHTON SA CHANG THP
Citation: Ky. Lee et al., HIGH-ASPECT-RATIO ALIGNED MULTILAYER MICROSTRUCTURE FABRICATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3425-3430
EMISSION CHARACTERISTICS OF ULTRASHARP COLD FIELD EMITTERS
Authors: YU ML HUSSEY BW KIM HS CHANG THP
Citation: Ml. Yu et al., EMISSION CHARACTERISTICS OF ULTRASHARP COLD FIELD EMITTERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3431-3435
SUB-40 NM RESOLUTION 1 KEV SCANNING TUNNELING MICROSCOPE FIELD-EMISSION MICROCOLUMN
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML CHANG THP
Citation: E. Kratschmer et al., SUB-40 NM RESOLUTION 1 KEV SCANNING TUNNELING MICROSCOPE FIELD-EMISSION MICROCOLUMN, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3503-3507
OXYGEN PROCESSED FIELD-EMISSION TIPS FOR MICROCOLUMN APPLICATIONS
Authors: KIM HS YU ML STAUFER U MURAY LP KERN DP CHANG THP
Citation: Hs. Kim et al., OXYGEN PROCESSED FIELD-EMISSION TIPS FOR MICROCOLUMN APPLICATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2327-2331
ARRAYED MINIATURE ELECTRON-BEAM COLUMNS
Authors: CHANG THP MURRAY LP STAUFER U KERN DP
Citation: Thp. Chang et al., ARRAYED MINIATURE ELECTRON-BEAM COLUMNS, Microelectronic engineering, 21(1-4), 1993, pp. 129-140
Risultati: 1-24 |