Citation: Qy. Shao et al., Cluster nucleation limited by growth pattern coverage in thin film preparation from vapor, CHIN PHYS, 10, 2001, pp. S140-S143
Authors:
Shao, QY
Fang, RC
Zhu, KG
Liao, YA
Xue, ZQ
Citation: Qy. Shao et al., Initial growth of thin films with low nucleus density and linear lateral growth rate on a substrate surface, CHIN PHYS L, 18(8), 2001, pp. 1135-1137
Authors:
Wang, Y
Wai, LY
Liu, H
Zhang, XX
Chang, YC
Luo, HL
Lou, LR
Fang, RC
Citation: Y. Wang et al., MBE grown monocrystalline GaAs films on polycrystalline AlN thick films for power device applications, J CRYST GR, 227, 2001, pp. 177-182
Citation: Qy. Shao et al., Growth evolution of thin films from vapor: The role of small mobility clusters at the nucleation stage, PROG CRYST, 40(1-4), 2000, pp. 221-225
Citation: Gz. Wang et al., Micro-Raman analysis of the cross-section of a diamond film prepared by hot-filament chemical vapor deposition, DIAM RELAT, 9(9-10), 2000, pp. 1712-1715
Citation: Ch. Li et al., Diamond synthesis with hot filament chemical vapor deposition (HFCVD) in the presence of iron, MOD PHY L B, 14(1), 2000, pp. 7-13
Authors:
Liao, Y
Ye, F
Shao, QY
Chang, C
Wang, GZ
Fang, RC
Citation: Y. Liao et al., Study of diamond film growth mechanism on porous silicon during hot-filament chemical vapor deposition, THIN SOL FI, 368(2), 2000, pp. 211-215
Citation: Ng. Shang et al., Deposition of (100) and (110) textured diamond films on aluminum nitride ceramics via hot filament chemical vapor deposition, JPN J A P 1, 38(3A), 1999, pp. 1500-1502
Authors:
Wang, GZ
Ye, F
Chang, C
Zhang, YH
Fang, RC
Citation: Gz. Wang et al., Micro-Raman analysis of the cross section for diamond film prepared by chemical vapor deposition, ACT PHY C E, 48(12), 1999, pp. 2382-2388
Citation: Jg. Xue et al., Band lineup of SiOx/ZnS (111) heterojunction: a synchrotron radiation photoemission study, THIN SOL FI, 334(1-2), 1998, pp. 20-24
Authors:
Cui, JB
Shang, NG
Liao, Y
Li, JQ
Fang, RC
Citation: Jb. Cui et al., Growth and characterization of diamond films deposited by dc discharge assisted hot filament chemical vapor deposition, THIN SOL FI, 334(1-2), 1998, pp. 156-160