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Results: 1-24 |
Results: 24
An analog VLSI for analog-to-binary image conversion
Authors: Sasaki, M Fujiyama, H
Citation: M. Sasaki et H. Fujiyama, An analog VLSI for analog-to-binary image conversion, ELEC C JP 3, 84(4), 2001, pp. 11-20
New reactive sputtering model considering the effect of the electron emission coefficiency for MgO deposition
Authors: Matsuda, Y Tashiro, K Otomo, K Fujiyama, H
Citation: Y. Matsuda et al., New reactive sputtering model considering the effect of the electron emission coefficiency for MgO deposition, IEICE TR EL, E84C(11), 2001, pp. 1667-1672
Quantitative modeling of reactive sputtering process for MgO thin film deposition
Authors: Matsuda, Y Otomo, K Fujiyama, H
Citation: Y. Matsuda et al., Quantitative modeling of reactive sputtering process for MgO thin film deposition, THIN SOL FI, 390(1-2), 2001, pp. 59-63
Large-area uniform dust-free plasma CVD
Authors: Fujiyama, H Maemura, Y Yamaguchi, T
Citation: H. Fujiyama et al., Large-area uniform dust-free plasma CVD, THIN SOL FI, 390(1-2), 2001, pp. 76-82
Salt tolerance of grain crops in relation to ionic balance and ability to absorb microelements
Authors: Jumberi, A Yamada, M Yamada, S Fujiyama, H
Citation: A. Jumberi et al., Salt tolerance of grain crops in relation to ionic balance and ability to absorb microelements, SOIL SCI PL, 47(4), 2001, pp. 657-664
Catalytic activity of Cu ion-exchanged Na center dot MCM-41 in the liquid-phase oxidation of 2,6-di-tert-butylphenol
Authors: Kohara, I Fujiyama, H Iwai, K Nishiyama, S Tsuruya, S
Citation: I. Kohara et al., Catalytic activity of Cu ion-exchanged Na center dot MCM-41 in the liquid-phase oxidation of 2,6-di-tert-butylphenol, J MOL CAT A, 153(1-2), 2000, pp. 93-101
Inner coating of long-narrow tube by plasma sputtering
Authors: Fujiyama, H
Citation: H. Fujiyama, Inner coating of long-narrow tube by plasma sputtering, SURF COAT, 131(1-3), 2000, pp. 278-283
Preparation of multi-layer carbon nitride films by alternate processes of magnetron sputtering and ion beam implantation
Authors: Shibata, T Jin, YS Matsuda, Y Fujiyama, H
Citation: T. Shibata et al., Preparation of multi-layer carbon nitride films by alternate processes of magnetron sputtering and ion beam implantation, SURF COAT, 131(1-3), 2000, pp. 428-432
a-Si : H film deposition using same phase modulated scanning plasma method
Authors: Maemura, Y Yamaguchi, T Yang, SC Fujiyama, H
Citation: Y. Maemura et al., a-Si : H film deposition using same phase modulated scanning plasma method, THIN SOL FI, 374(2), 2000, pp. 274-277
Characteristics of scanning mirror-type magnetic field coaxial electron cyclotron resonance plasma for inner coating of slender glass tubes
Authors: Nagano, T Fujiyama, H
Citation: T. Nagano et H. Fujiyama, Characteristics of scanning mirror-type magnetic field coaxial electron cyclotron resonance plasma for inner coating of slender glass tubes, JPN J A P 1, 38(7B), 1999, pp. 4338-4341
Extended anode effect in coaxial magnetron pulsed plasmas for coating the inside surface of narrow tubes
Authors: Sugimoto, S Uchikawa, Y Kuwahara, K Fujiyama, H Kuwahara, H
Citation: S. Sugimoto et al., Extended anode effect in coaxial magnetron pulsed plasmas for coating the inside surface of narrow tubes, JPN J A P 1, 38(7B), 1999, pp. 4342-4345
Relationship between intensity of fullerene-mass spectrum and carbon vibrational temperature in microwave-helium plasmas
Authors: Ueda, K Kuwahara, K Fujiyama, H
Citation: K. Ueda et al., Relationship between intensity of fullerene-mass spectrum and carbon vibrational temperature in microwave-helium plasmas, JPN J A P 1, 38(7B), 1999, pp. 4512-4514
Large-area uniform surface treatment of polymeric materials using a scanning plasma method
Authors: Yang, SC Yanagi, J Yamamoto, K Uyama, H Fujiyama, H
Citation: Sc. Yang et al., Large-area uniform surface treatment of polymeric materials using a scanning plasma method, JPN J A P 1, 38(7B), 1999, pp. 4527-4530
Effects of crossed magnetic fields on silicon particles in plasma chemicalvapor deposition process
Authors: Fujiyama, H Maemura, Y Ohtsu, M
Citation: H. Fujiyama et al., Effects of crossed magnetic fields on silicon particles in plasma chemicalvapor deposition process, JPN J A P 1, 38(7B), 1999, pp. 4550-4555
Titanium coating of the inner of a 1 m long narrow tube by double-ended anode coaxial magnetron-pulsed plasmas
Authors: Uchikawa, Y Sugimoto, S Kuwahara, K Fujiyama, H Kuwahara, H
Citation: Y. Uchikawa et al., Titanium coating of the inner of a 1 m long narrow tube by double-ended anode coaxial magnetron-pulsed plasmas, SURF COAT, 112(1-3), 1999, pp. 185-188
Structural and bonding properties of carbon nitride films prepared by dc magnetron sputtering
Authors: Jin, YS Shibata, T Matsuda, Y Fujiyama, H
Citation: Ys. Jin et al., Structural and bonding properties of carbon nitride films prepared by dc magnetron sputtering, THIN SOL FI, 345(1), 1999, pp. 18-22
Particle formation and a-Si : H film deposition in narrow-gap RF plasma CVD
Authors: Maemura, Y Fujiyama, H Takagi, T Hayashi, R Futako, W Kondo, M Matsuda, A
Citation: Y. Maemura et al., Particle formation and a-Si : H film deposition in narrow-gap RF plasma CVD, THIN SOL FI, 345(1), 1999, pp. 80-84
Temperature measurement of polymer substrates during plasma irradiation
Authors: Yamamoto, K Harada, T Tomikawa, N Uyama, H Yang, SC Fujiyama, H
Citation: K. Yamamoto et al., Temperature measurement of polymer substrates during plasma irradiation, THIN SOL FI, 345(1), 1999, pp. 94-98
Two-dimensional spatial distributions of sputtered particles produced in aplanar magnetron discharge of indium-tin-oxide target
Authors: Matsuda, Y Muta, M Fujiyama, H
Citation: Y. Matsuda et al., Two-dimensional spatial distributions of sputtered particles produced in aplanar magnetron discharge of indium-tin-oxide target, THIN SOL FI, 345(1), 1999, pp. 167-171
Correlation between silicon particles and modulated crossed magnetic fieldin silane plasmas
Authors: Tazoe, K Yang, SC Maemura, Y Ohtsu, M Fujiyama, H
Citation: K. Tazoe et al., Correlation between silicon particles and modulated crossed magnetic fieldin silane plasmas, THIN SOL FI, 341(1-2), 1999, pp. 55-58
Control of silicon particle behavior using a low frequency electromagneticfield in silane plasma chemical vapor deposition
Authors: Yang, SC Fujiyama, H
Citation: Sc. Yang et H. Fujiyama, Control of silicon particle behavior using a low frequency electromagneticfield in silane plasma chemical vapor deposition, THIN SOL FI, 341(1-2), 1999, pp. 59-62
Two-dimensional spatial profiles of plasma parameters in DC reactive magnetron sputtering of indium-tin-oxide
Authors: Muta, M Ohgushi, S Matsuda, Y Fujiyama, H
Citation: M. Muta et al., Two-dimensional spatial profiles of plasma parameters in DC reactive magnetron sputtering of indium-tin-oxide, THIN SOL FI, 341(1-2), 1999, pp. 221-224
Liquid-phase oxidation of 2,6-di-tert-butylphenol with Cu-impregnated MCM-41 catalysts in the presence of alkali metals
Authors: Fujiyama, H Kohara, I Iwai, K Nishiyama, S Tsuruya, S Masai, M
Citation: H. Fujiyama et al., Liquid-phase oxidation of 2,6-di-tert-butylphenol with Cu-impregnated MCM-41 catalysts in the presence of alkali metals, J CATALYSIS, 188(2), 1999, pp. 417-425
Dynamic characteristic analysis and combustion control for a fluidized bedincinerator
Authors: Miyamoto, Y Kurosaki, Y Fujiyama, H Nanbu, E
Citation: Y. Miyamoto et al., Dynamic characteristic analysis and combustion control for a fluidized bedincinerator, CON ENG PR, 6(9), 1998, pp. 1159-1168
Risultati: 1-24 |