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Results: 1-25/27
Authors:
KUO CH
BOONZAAYER M
DEHERRERA M
KYONG T
ZHANG YH
JOHS B
HALE JS
Citation: Ch. Kuo et al., REAL-TIME IN-SITU COMPOSITION CONTROL OF INGAAS LATTICE-MATCHED TO INP BY AN 88-WAVELENGTH ELLIPSOMETER, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1484-1488
Authors:
ALMEIDA LA
JOHNSON JN
BENSON JD
DINAN JH
JOHS B
Citation: La. Almeida et al., AUTOMATED COMPOSITIONAL CONTROL OF HG1-XCDXTE DURING MBE, USING IN-SITU SPECTROSCOPIC ELLIPSOMETRY, Journal of electronic materials, 27(6), 1998, pp. 500-503
Authors:
ALTEROVITZ SA
JOHS B
Citation: Sa. Alterovitz et B. Johs, MULTIPLE MINIMA IN THE ELLIPSOMETRIC ERROR FUNCTION, Thin solid films, 313, 1998, pp. 124-127
Authors:
JOHS B
HERZINGER CM
DINAN JH
CORNFELD A
BENSON JD
Citation: B. Johs et al., DEVELOPMENT OF A PARAMETRIC OPTICAL-CONSTANT MODEL FOR HG1-XCDXTE FORCONTROL OF COMPOSITION BY SPECTROSCOPIC ELLIPSOMETRY DURING MBE GROWTH, Thin solid films, 313, 1998, pp. 137-142
Authors:
HERZINGER CM
JOHS B
MCGAHAN WA
PAULSON W
Citation: Cm. Herzinger et al., A MULTISAMPLE, MULTIWAVELENGTH, MULTI-ANGLE INVESTIGATION OF THE INTERFACE LAYER BETWEEN SILICON AND THERMALLY GROWN SILICON DIOXIDE, Thin solid films, 313, 1998, pp. 281-285
Authors:
JOHS B
HERZINGER C
DINAN JH
CORNFELD A
BENSON JD
DOCTOR D
OLSON G
FERGUSON I
PELCZYNSKI M
CHOW P
KUO CH
JOHNSON S
Citation: B. Johs et al., REAL-TIME MONITORING AND CONTROL OF EPITAXIAL SEMICONDUCTOR GROWTH INA PRODUCTION ENVIRONMENT BY IN-SITU SPECTROSCOPIC ELLIPSOMETRY, Thin solid films, 313, 1998, pp. 490-495
Authors:
ELMAN JF
GREENER J
HERZINGER CM
JOHS B
Citation: Jf. Elman et al., CHARACTERIZATION OF BIAXIALLY-STRETCHED PLASTIC FILMS BY GENERALIZED ELLIPSOMETRY, Thin solid films, 313, 1998, pp. 814-818
Authors:
HERZINGER CM
JOHS B
MCGAHAN WA
WOOLLAM JA
PAULSON W
Citation: Cm. Herzinger et al., ELLIPSOMETRIC DETERMINATION OF OPTICAL-CONSTANTS FOR SILICON AND THERMALLY GROWN SILICON DIOXIDE VIA A MULTISAMPLE, MULTIWAVELENGTH, MULTI-ANGLE INVESTIGATION, Journal of applied physics, 83(6), 1998, pp. 3323-3336
Authors:
JOHS B
HERZINGER C
HE P
PITTAL S
WOOLLAM J
WAGNER T
Citation: B. Johs et al., REAL-TIME MONITORING AND CONTROL DURING MBE GROWTH OF GAAS ALGAAS BRAGG REFLECTORS USING MULTIWAVELENGTH ELLIPSOMETRY/, Materials science & engineering. B, Solid-state materials for advanced technology, 44(1-3), 1997, pp. 134-138
Authors:
YAO HD
JOHS B
JAMES RB
Citation: Hd. Yao et al., OPTICAL ANISOTROPIC-DIELECTRIC RESPONSE OF MERCURIC IODIDE, Physical review. B, Condensed matter, 56(15), 1997, pp. 9414-9421
Authors:
KUO CH
BOONZAAYER MD
DEHERRERA MF
SCHRODER DK
MARACAS GN
JOHS B
Citation: Ch. Kuo et al., REAL-TIME IN-SITU THICKNESS CONTROL OF FABRY-PEROT CAVITIES IN MBE BY44 AND 88 WAVELENGTH ELLIPSOMETRY, Journal of crystal growth, 175, 1997, pp. 281-285
Authors:
BENSON JD
CORNFELD AB
MARTINKA M
DINAN JH
JOHS B
HE P
WOOLLAM JA
Citation: Jd. Benson et al., ELLIPSOMETRIC ANALYSIS OF CDZNTE PREPARATION FOR HGCDTE MBE GROWTH, Journal of crystal growth, 175, 1997, pp. 659-664
Authors:
SCHUBERT M
RHEINLANDER B
CRAMER C
SCHMIEDEL H
WOOLLAM JA
HERZINGER CM
JOHS B
Citation: M. Schubert et al., GENERALIZED TRANSMISSION ELLIPSOMETRY FOR TWISTED BIAXIAL DIELECTRIC MEDIA - APPLICATION TO CHIRAL LIQUID-CRYSTALS, Journal of the Optical Society of America. A, Optics, image science,and vision., 13(9), 1996, pp. 1930-1940
Authors:
SCHUBERT M
RHEINLANDER B
WOOLLAM JA
JOHS B
HERZINGER CM
Citation: M. Schubert et al., EXTENSION OF ROTATING-ANALYZER ELLIPSOMETRY TO GENERALIZED ELLIPSOMETRY - DETERMINATION OF THE DIELECTRIC FUNCTION TENSOR FROM UNIAXIAL TIO2, Journal of the Optical Society of America. A, Optics, image science,and vision., 13(4), 1996, pp. 875-883
Authors:
HERZINGER CM
SNYDER PG
CELLI FG
KAO YC
CHOW D
JOHS B
WOOLLAM JA
Citation: Cm. Herzinger et al., STUDIES OF THIN STRAINED INAS, ALAS, AND ALSB LAYERS BY SPECTROSCOPICELLIPSOMETRY, Journal of applied physics, 79(5), 1996, pp. 2663-2674
Authors:
SNYDER PG
IANNO NJ
WIGERT B
PITTAL S
JOHS B
WOOLLAM JA
Citation: Pg. Snyder et al., SPECTROSCOPIC ELLIPSOMETRIC MONITORING OF ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING OF GAAS AND ALGAAS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2255-2259
Authors:
MURTHY SD
BHAT I
JOHS B
PITTAL S
HE P
Citation: Sd. Murthy et al., REAL-TIME CONTROL OF HGCDTE GROWTH BY ORGANOMETALLIC VAPOR-PHASE EPITAXY USING SPECTROSCOPIC ELLIPSOMETRY, Journal of electronic materials, 24(9), 1995, pp. 1087-1091
Authors:
MURTHY SD
BHAT IB
JOHS B
PITTAL S
HE P
Citation: Sd. Murthy et al., APPLICATION OF SPECTROSCOPIC ELLIPSOMETRY FOR REAL-TIME CONTROL OF CDTE AND HGCDTE GROWTH IN AN OMCVD SYSTEM, Journal of electronic materials, 24(5), 1995, pp. 445-449
Authors:
HERZINGER CM
YAO H
SNYDER PG
CELII FG
KAO YC
JOHS B
WOOLLAM JA
Citation: Cm. Herzinger et al., DETERMINATION OF ALAS OPTICAL-CONSTANTS BY VARIABLE-ANGLE SPECTROSCOPIC ELLIPSOMETRY AND A MULTISAMPLE ANALYSIS, Journal of applied physics, 77(9), 1995, pp. 4677-4687
Authors:
HERZINGER CM
SNYDER PG
JOHS B
WOOLLAM JA
Citation: Cm. Herzinger et al., INP OPTICAL-CONSTANTS BETWEEN 0.75 AND 5.0 EV DETERMINED BY VARIABLE-ANGLE SPECTROSCOPIC ELLIPSOMETRY, Journal of applied physics, 77(4), 1995, pp. 1715-1724
Authors:
WOOLLAM JA
MCGAHAN WA
JOHS B
Citation: Ja. Woollam et al., SPECTROSCOPIC ELLIPSOMETRY STUDIES OF INDIUM TIN OXIDE AND OTHER FLAT-PANEL DISPLAY MULTILAYER MATERIALS, Thin solid films, 241(1-2), 1994, pp. 44-46
HARDWARE AND SOFTWARE FOR IN-SITU PROCESS MONITOR AND CONTROL USING MULTIPLE WAVELENGTH ELLIPSOMETRY
Authors:
JOHS B
DOERR D
PITTAL S
WOOLLAM JA
Citation: B. Johs et al., HARDWARE AND SOFTWARE FOR IN-SITU PROCESS MONITOR AND CONTROL USING MULTIPLE WAVELENGTH ELLIPSOMETRY, Surface & coatings technology, 62(1-3), 1993, pp. 680-682
Authors:
JOHS B
Citation: B. Johs, REGRESSION CALIBRATION METHOD FOR ROTATING ELEMENT ELLIPSOMETERS, Thin solid films, 234(1-2), 1993, pp. 395-398
Authors:
MCGAHAN WA
JOHS B
WOOLLAM JA
Citation: Wa. Mcgahan et al., TECHNIQUES FOR ELLIPSOMETRIC MEASUREMENT OF THE THICKNESS AND OPTICAL-CONSTANTS OF THIN ABSORBING FILMS, Thin solid films, 234(1-2), 1993, pp. 443-446
Authors:
ORLOFF GJ
WOOLLAM JA
HE P
MCGAHAN WA
MCNEIL JR
JACOBSON RD
JOHS B
Citation: Gj. Orloff et al., EX-SITU VARIABLE-ANGLE SPECTROSCOPIC ELLIPSOMETRY STUDIES OF ELECTRON-CYCLOTRON-RESONANCE ETCHING OF HG1-XCDXTE, Thin solid films, 233(1-2), 1993, pp. 46-49