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Results: 1-18 |
Results: 18

Authors: SELMI L PAVESI M WONG HSP ACOVIC A SANGIORGI E
Citation: L. Selmi et al., MONITORING HOT-CARRIER DEGRADATION IN SOI MOSFETS BY HOT-CARRIER LUMINESCENCE TECHNIQUES, I.E.E.E. transactions on electron devices, 45(5), 1998, pp. 1135-1139

Authors: SELMI L MASTRAPASQUA M BOULIN DM BUDE JD PAVESI M SANGIORGI E PINTO MR
Citation: L. Selmi et al., VERIFICATION OF ELECTRON DISTRIBUTIONS IN SILICON BY MEANS OF HOT-CARRIER LUMINESCENCE MEASUREMENTS, I.E.E.E. transactions on electron devices, 45(4), 1998, pp. 802-808

Authors: SANGIORGI E CURATOLO M
Citation: E. Sangiorgi et M. Curatolo, APPLICATION OF A SEQUENTIAL ANALYTICAL PROCEDURE FOR THE DETECTION OFTHE BETA-AGONIST BROMBUTEROL IN BOVINE URINE SAMPLES, Journal of chromatography B. Biomedical sciences and applications, 693(2), 1997, pp. 468-478

Authors: SELMI L GHETTI A BEZ R SANGIORGI E
Citation: L. Selmi et al., TRADE-OFFS BETWEEN TUNNELING AND HOT-CARRIER INJECTION IN SHORT-CHANNEL FLOATING-GATE MOSFETS, Microelectronic engineering, 36(1-4), 1997, pp. 293-296

Authors: FISCHER B GHETTI A SELMI L BEZ R SANGIORGI E
Citation: B. Fischer et al., BIAS AND TEMPERATURE-DEPENDENCE OF HOMOGENEOUS HOT-ELECTRON INJECTIONFROM SILICON INTO SILICON DIOXIDE AT LOW VOLTAGES, I.E.E.E. transactions on electron devices, 44(2), 1997, pp. 288-296

Authors: FISCHER B SELMI L GHETTI A SANGIORGI E
Citation: B. Fischer et al., ELECTRON INJECTION INTO THE GATE OXIDE OF MOS STRUCTURES AT LIQUID-NITROGEN TEMPERATURE - MEASUREMENT AND SIMULATION, Journal de physique. IV, 6(C3), 1996, pp. 19-24

Authors: GURRIERI F PRINOS P TACKELS D KILPATRICK MW ALLANSON J GENUARDI M VUCKOV A NANNI L SANGIORGI E GAROFALO G NUNES ME NERI G SCHWARTZ C TSIPOURAS P
Citation: F. Gurrieri et al., A SPLIT HAND-SPLIT FOOT (SHFM3) GENE IS LOCATED AT 10Q24-]25, American journal of medical genetics, 62(4), 1996, pp. 427-436

Authors: ESSENI D SELMI L SANGIORGI E BEZ R RICCO B
Citation: D. Esseni et al., TEMPERATURE-DEPENDENCE OF GATE AND SUBSTRATE CURRENTS IN THE CHE CROSSOVER REGIME, IEEE electron device letters, 16(11), 1995, pp. 506-508

Authors: SELMI L SANGIORGI E BEZ R
Citation: L. Selmi et al., NONLOCAL EFFECTS IN P-MOSFET SUBSTRATE HOT-HOLE INJECTION EXPERIMENTS, IEEE electron device letters, 16(10), 1995, pp. 442-444

Authors: TSUBOI Y FIEGNA C SANGIORGI E RICCO B WADA T KATSUMATA Y IWAI H
Citation: Y. Tsuboi et al., MONTE-CARLO ANALYSIS OF VELOCITY OVERSHOOT EFFECTS IN BIPOLAR-DEVICESWITH AND WITHOUT AN I-LAYER, IEICE transactions on electronics, E77C(2), 1994, pp. 174-178

Authors: ABRAMO A BRUNETTI R JACOBONI C VENTURI F SANGIORGI E
Citation: A. Abramo et al., A MULTIBAND MONTE-CARLO APPROACH TO COULOMB INTERACTION FOR DEVICE ANALYSIS, Journal of applied physics, 76(10), 1994, pp. 5786-5794

Authors: FIEGNA C SANGIORGI E SELMI L
Citation: C. Fiegna et al., OXIDE-FIELD DEPENDENCE OF ELECTRON INJECTION FROM SILICON INTO SILICON DIOXIDE - REPLY, I.E.E.E. transactions on electron devices, 41(9), 1994, pp. 1681-1683

Authors: FIEGNA C IWAI H WADA T SAITO M SANGIORGI E RICCO B
Citation: C. Fiegna et al., SCALING THE MOS-TRANSISTOR BELOW 0.1 MU-M - METHODOLOGY, DEVICE STRUCTURES, AND TECHNOLOGY REQUIREMENTS, I.E.E.E. transactions on electron devices, 41(6), 1994, pp. 941-951

Authors: PINTO MR SANGIORGI E BUDE J
Citation: Mr. Pinto et al., SILICON MOS TRANSCONDUCTANCE SCALING INTO THE OVERSHOOT REGIME, IEEE electron device letters, 14(8), 1993, pp. 375-378

Authors: ABRAMO A VENTURI F SANGIORGI E HIGMAN JM RICCO B
Citation: A. Abramo et al., A NUMERICAL-METHOD TO COMPUTE ISOTROPIC BAND MODELS FROM ANISOTROPIC SEMICONDUCTOR BAND STRUCTURES, IEEE transactions on computer-aided design of integrated circuits and systems, 12(9), 1993, pp. 1327-1336

Authors: FIEGNA C SANGIORGI E
Citation: C. Fiegna et E. Sangiorgi, DETERMINATION OF SPACE-DEPENDENT ELECTRON-DISTRIBUTION FUNCTION BY COMBINED USE OF ENERGY AND BOLTZMANN TRANSPORT-EQUATIONS - IMPROVEMENT, EVALUATION, AND EXPLANATION - REPLY, I.E.E.E. transactions on electron devices, 40(12), 1993, pp. 2369-2370

Authors: FIEGNA C SANGIORGI E SELMI L
Citation: C. Fiegna et al., OXIDE-FIELD DEPENDENCE OF ELECTRON INJECTION FROM SILICON INTO SILICON DIOXIDE, I.E.E.E. transactions on electron devices, 40(11), 1993, pp. 2018-2022

Authors: ABRAMO A VENTURI F SANGIORGI E FIEGNA C RICCO B BRUNETTI R QUADE W JACOBONI C
Citation: A. Abramo et al., A MULTIBAND MODEL FOR HOLE TRANSPORT IN SILICON AT HIGH-ENERGIES, Semiconductor science and technology, 7(3B), 1992, pp. 597-600
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