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Results: 1-17 |
Results: 17
OPTIMIZATION OF EMPIRICAL-MODEL FOR IC FABRICATION PROCESS USING LINEAR-PROGRAMMING
Authors: SPREVAK D FERGUSON RS WALTON AJ NEWSAM MI
Citation: D. Sprevak et al., OPTIMIZATION OF EMPIRICAL-MODEL FOR IC FABRICATION PROCESS USING LINEAR-PROGRAMMING, IEE proceedings. Science, measurement and technology, 145(2), 1998, pp. 58-60
THEORETICAL AND EXPERIMENTAL-ANALYSIS OF WIRE SEGMENT HOLOGRAMS FOR STATISTICAL INTERCONNECT METROLOGY
Authors: ABUGHAZALEH SA STEVENSON JTM CHRISTIE P WALTON AJ
Citation: Sa. Abughazaleh et al., THEORETICAL AND EXPERIMENTAL-ANALYSIS OF WIRE SEGMENT HOLOGRAMS FOR STATISTICAL INTERCONNECT METROLOGY, IEEE transactions on semiconductor manufacturing, 11(2), 1998, pp. 225-231
CRITICAL AREA EXTRACTION FOR SOFT FAULT ESTIMATION
Authors: ALLAN GA WALTON AJ
Citation: Ga. Allan et Aj. Walton, CRITICAL AREA EXTRACTION FOR SOFT FAULT ESTIMATION, IEEE transactions on semiconductor manufacturing, 11(1), 1998, pp. 146-154
TOTAL TCAD STRATEGY FOR DFM IN IC TECHNOLOGY DEVELOPMENT
Authors: WALTON AJ FALLON M NEWSAM MI FERGUSON RS SPREVAK D ELLIOTT JP ALLAN GA
Citation: Aj. Walton et al., TOTAL TCAD STRATEGY FOR DFM IN IC TECHNOLOGY DEVELOPMENT, IEE proceedings. Science, measurement and technology, 144(2), 1997, pp. 63-68
GUEST EDITORIAL - ICMTS96
Authors: JEPPSON KO WALTON AJ
Citation: Ko. Jeppson et Aj. Walton, GUEST EDITORIAL - ICMTS96, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 194-195
AN ELECTRICAL TEST STRUCTURE FOR THE MEASUREMENT OF PLANARIZATION
Authors: ELLIOTT JP FALLON M WALTON AJ STEVENSON JTM OHARA A GUNDLACH AM
Citation: Jp. Elliott et al., AN ELECTRICAL TEST STRUCTURE FOR THE MEASUREMENT OF PLANARIZATION, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 242-249
EFFICIENT CRITICAL AREA MEASUREMENTS OF IC LAYOUT APPLIED TO QUALITY AND RELIABILITY ENHANCEMENT
Authors: ALLAN GA WALTON AJ
Citation: Ga. Allan et Aj. Walton, EFFICIENT CRITICAL AREA MEASUREMENTS OF IC LAYOUT APPLIED TO QUALITY AND RELIABILITY ENHANCEMENT, Microelectronics and reliability, 37(12), 1997, pp. 1825-1833
SCREENING OF VARIABLES FOR THE EMPIRICAL MODELING OF SEMICONDUCTOR-DEVICES
Authors: SPREVAK D FERGUSON RS WALTON AJ FALLON M NEWSAM MI
Citation: D. Sprevak et al., SCREENING OF VARIABLES FOR THE EMPIRICAL MODELING OF SEMICONDUCTOR-DEVICES, IEE proceedings. Science, measurement and technology, 143(5), 1996, pp. 319-326
THE APPLICATION OF DOE AND RSM TECHNIQUES FOR WAFER MAPPING IN IC TECHNOLOGY
Authors: WALTON AJ FALLON M WILSON D
Citation: Aj. Walton et al., THE APPLICATION OF DOE AND RSM TECHNIQUES FOR WAFER MAPPING IN IC TECHNOLOGY, IEICE transactions on electronics, E79C(2), 1996, pp. 219-225
THE ACOUSTIC BUBBLE CAPACITOR - A NEW METHOD FOR SIZING GAS-BUBBLES IN LIQUIDS
Authors: HARDWICK AJ WALTON AJ
Citation: Aj. Hardwick et Aj. Walton, THE ACOUSTIC BUBBLE CAPACITOR - A NEW METHOD FOR SIZING GAS-BUBBLES IN LIQUIDS, Measurement science & technology, 6(2), 1995, pp. 202-205
FABRICATION OF 200 NM FIELD-EFFECT TRANSISTOR BY X-RAY-LITHOGRAPHY WITH A LASER-PLASMA X-RAY SOURCE
Authors: REEVES CM TURCU ICE PREWETT PD GUNDLACH AM STEVENSON JT WALTON AJ ROSS AWS LAWES RA ANASTASI P BURGE R MITCHELL P
Citation: Cm. Reeves et al., FABRICATION OF 200 NM FIELD-EFFECT TRANSISTOR BY X-RAY-LITHOGRAPHY WITH A LASER-PLASMA X-RAY SOURCE, Electronics Letters, 31(25), 1995, pp. 2218-2219
PERCUTANEOUS TRANS-ENDOCARDIAL LASER REVASCULARIZATION
Authors: OESTERLE SN WALTON AJ KERNOFF R APFELBAUM MA BURKHOFF D KESTEN RJ AITA M SIMPSON CJ JAVIER MA
Citation: Sn. Oesterle et al., PERCUTANEOUS TRANS-ENDOCARDIAL LASER REVASCULARIZATION, Circulation, 92(8), 1995, pp. 2948-2948
COMPARISON BETWEEN COMPUTER-SIMULATION AND DIRECT SECONDARY-ION MASS-SPECTROMETRY MEASUREMENT OF LATERAL DOPANT DISTRIBUTIONS
Authors: COOKE GA DOWSETT MG HILL C PEARSON PJ WALTON AJ
Citation: Ga. Cooke et al., COMPARISON BETWEEN COMPUTER-SIMULATION AND DIRECT SECONDARY-ION MASS-SPECTROMETRY MEASUREMENT OF LATERAL DOPANT DISTRIBUTIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 243-246
DESIGN CONSIDERATIONS FOR A GAUDI TEST STRUCTURE WHICH CAN BE USED TODETERMINE THE OPTIMUM FOCUS
Authors: FALLON M WALTON AJ STEVENSON JTM ROSS AWS
Citation: M. Fallon et al., DESIGN CONSIDERATIONS FOR A GAUDI TEST STRUCTURE WHICH CAN BE USED TODETERMINE THE OPTIMUM FOCUS, IEEE transactions on semiconductor manufacturing, 7(3), 1994, pp. 272-278
THE INTEGRATION OF SIMULATION AND RESPONSE-SURFACE METHODOLOGY FOR THE OPTIMIZATION OF IC PROCESSES
Authors: GASTON GJ WALTON AJ
Citation: Gj. Gaston et Aj. Walton, THE INTEGRATION OF SIMULATION AND RESPONSE-SURFACE METHODOLOGY FOR THE OPTIMIZATION OF IC PROCESSES, IEEE transactions on semiconductor manufacturing, 7(1), 1994, pp. 22-33
LOW-LOSS, SINGLE-MODE, OPTICAL-PHASE MODULATOR IN SIMOX MATERIAL
Authors: TANG CK REED GT WALTON AJ RICKMAN AG
Citation: Ck. Tang et al., LOW-LOSS, SINGLE-MODE, OPTICAL-PHASE MODULATOR IN SIMOX MATERIAL, Journal of lightwave technology, 12(8), 1994, pp. 1394-1400
IMPROVED STRUCTURE FOR OPTIMIZATION OF FOCUS AND EXPOSURE FOR IC PRODUCTION
Authors: WALTON AJ FALLON M STEVENSON JTM ROSS AWS REEVES CM
Citation: Aj. Walton et al., IMPROVED STRUCTURE FOR OPTIMIZATION OF FOCUS AND EXPOSURE FOR IC PRODUCTION, Electronics Letters, 29(17), 1993, pp. 1573-1574
Risultati: 1-17 |