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Results: 1-23 |
Results: 23
Minimization of dry etch damage in III-V semiconductors
Authors: Rahman, M Deng, LG van den Berg, J Wilkinson, CDW
Citation: M. Rahman et al., Minimization of dry etch damage in III-V semiconductors, J PHYS D, 34(18), 2001, pp. 2792-2797
Studies of damage in low-power reactive-ion etching of III-V semiconductors
Authors: Rahman, M Deng, LG Wilkinson, CDW van den Berg, JA
Citation: M. Rahman et al., Studies of damage in low-power reactive-ion etching of III-V semiconductors, J APPL PHYS, 89(4), 2001, pp. 2096-2108
Imaging magnetic domain structure in sub-500 nm thin film elements
Authors: Kirk, KJ McVitie, S Chapman, JN Wilkinson, CDW
Citation: Kj. Kirk et al., Imaging magnetic domain structure in sub-500 nm thin film elements, J APPL PHYS, 89(11), 2001, pp. 7174-7176
Quantum electron beam probe of sidewall dry-etch damage
Authors: Rahman, M Williamson, JG Mathieson, K Dick, G Brown, MJ Duffy, S Wilkinson, CDW
Citation: M. Rahman et al., Quantum electron beam probe of sidewall dry-etch damage, MICROEL ENG, 53(1-4), 2000, pp. 371-374
Magnetization reversal of patterned spin-tunnel junction material: A transmission electron microscopy study
Authors: Ardhuin, H Chapman, JN Aitchison, PR Gillies, MF Kirk, KJ Wilkinson, CDW
Citation: H. Ardhuin et al., Magnetization reversal of patterned spin-tunnel junction material: A transmission electron microscopy study, J APPL PHYS, 88(5), 2000, pp. 2760-2765
Interactions and switching field distributions of nanoscale magnetic elements
Authors: Kirk, KJ Chapman, JN McVitie, S Aitchison, PR Wilkinson, CDW
Citation: Kj. Kirk et al., Interactions and switching field distributions of nanoscale magnetic elements, J APPL PHYS, 87(9), 2000, pp. 5105-5107
Enhanced damage due to light in low-damage reactive-ion etching processes
Authors: Deng, LG Rahman, M Wilkinson, CDW
Citation: Lg. Deng et al., Enhanced damage due to light in low-damage reactive-ion etching processes, APPL PHYS L, 76(20), 2000, pp. 2871-2873
Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching
Authors: Smith, CJM Murad, SK Krauss, TF De la Rue, RM Wilkinson, CDW
Citation: Cjm. Smith et al., Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching, J VAC SCI B, 17(1), 1999, pp. 113-117
Fabrication and photoluminescence of GaN sapphire submicron-scale structures with nanometre scale resolution
Authors: Ribayrol, A Coquillat, D De la Rue, RM Murad, SK Wilkinson, CDW Girard, P Briot, O Aulombard, RL
Citation: A. Ribayrol et al., Fabrication and photoluminescence of GaN sapphire submicron-scale structures with nanometre scale resolution, MAT SCI E B, 59(1-3), 1999, pp. 335-339
Observation of energy loss by a hot two-dimensional electron gas into coupled plasmon-phonon modes
Authors: Al Jawhari, H Kozorezov, AG Sahraoui-Tahar, M Wigmore, JK Wilkinson, CDW
Citation: H. Al Jawhari et al., Observation of energy loss by a hot two-dimensional electron gas into coupled plasmon-phonon modes, PHYSICA B, 263, 1999, pp. 211-213
Energy loss of hot electrons in double barrier resonant tunnelling structures
Authors: Kulikowski, A Giltrow, M Kozorezov, AG Sahraoui-Tahar, M Wigmore, JK Davies, JH Stanley, CR Vogel, B Wilkinson, CDW
Citation: A. Kulikowski et al., Energy loss of hot electrons in double barrier resonant tunnelling structures, PHYSICA B, 263, 1999, pp. 233-235
Nanoscale embossing of polymers using a thermoplastic die
Authors: Casey, BG Cumming, DRS Khandaker, II Curtis, ASG Wilkinson, CDW
Citation: Bg. Casey et al., Nanoscale embossing of polymers using a thermoplastic die, MICROEL ENG, 46(1-4), 1999, pp. 125-128
Design considerations for low damage process plasmas
Authors: Rahman, M Deng, LG Boyd, A Ribayrol, A Wilkinson, CDW van den Berg, JA Armour, DG
Citation: M. Rahman et al., Design considerations for low damage process plasmas, MICROEL ENG, 46(1-4), 1999, pp. 299-302
Modified AlAs epitaxial layers for use as pattern transfer masks
Authors: Smith, CJM Krauss, TF Murad, SK Wilkinson, CDW Boyd, A Stanley, CR Dawson, M De La Rue, RM
Citation: Cjm. Smith et al., Modified AlAs epitaxial layers for use as pattern transfer masks, MICROEL ENG, 46(1-4), 1999, pp. 327-330
Lorentz microscopy of small magnetic structures (invited)
Authors: Kirk, KJ Chapman, JN Wilkinson, CDW
Citation: Kj. Kirk et al., Lorentz microscopy of small magnetic structures (invited), J APPL PHYS, 85(8), 1999, pp. 5237-5242
SiGe p-channel MOSFETs with tungsten gate
Authors: Ternent, G Asenov, A Thayne, IG MacIntyre, DS Thoms, S Wilkinson, CDW Parker, EHC Gundlach, AM
Citation: G. Ternent et al., SiGe p-channel MOSFETs with tungsten gate, ELECTR LETT, 35(5), 1999, pp. 430-431
Coplanar waveguide transmission lines and high Q inductors on CMOS grade silicon using photoresist and polyimide
Authors: Ternent, G Ferguson, S Borsosfoldi, Z Elgaid, K Lohdi, T Edger, D Wilkinson, CDW Thayne, IG
Citation: G. Ternent et al., Coplanar waveguide transmission lines and high Q inductors on CMOS grade silicon using photoresist and polyimide, ELECTR LETT, 35(22), 1999, pp. 1957-1958
Switching of nanoscale magnetic elements
Authors: Kirk, KJ Chapman, JN McVitie, S Aitchison, PR Wilkinson, CDW
Citation: Kj. Kirk et al., Switching of nanoscale magnetic elements, APPL PHYS L, 75(23), 1999, pp. 3683-3685
Contribution of atomic and molecular ions to dry-etch damage
Authors: Deng, LG Rahman, M van den Berg, JA Wilkinson, CDW
Citation: Lg. Deng et al., Contribution of atomic and molecular ions to dry-etch damage, APPL PHYS L, 75(2), 1999, pp. 211-213
Control of silica cap properties by oxygen plasma treatment for single-capselective impurity free vacancy disordering
Authors: Helmy, AS Murad, SK Bryce, AC Aitchison, JS Marsh, JH Hicks, SE Wilkinson, CDW
Citation: As. Helmy et al., Control of silica cap properties by oxygen plasma treatment for single-capselective impurity free vacancy disordering, APPL PHYS L, 74(5), 1999, pp. 732-734
Nanofabrication in cellular engineering
Authors: Wilkinson, CDW Curtis, ASG Crossan, J
Citation: Cdw. Wilkinson et al., Nanofabrication in cellular engineering, J VAC SCI B, 16(6), 1998, pp. 3132-3136
Can dry-etching systems be designed for low damage ab initio?
Authors: Deng, LG Rahman, M Murad, SK Boyd, A Wilkinson, CDW
Citation: Lg. Deng et al., Can dry-etching systems be designed for low damage ab initio?, J VAC SCI B, 16(6), 1998, pp. 3334-3338
Artificial dielectric optical structures: A challenge for nanofabrication
Authors: Giaconia, C Torrini, R Murad, SK Wilkinson, CDW
Citation: C. Giaconia et al., Artificial dielectric optical structures: A challenge for nanofabrication, J VAC SCI B, 16(6), 1998, pp. 3903-3905
Risultati: 1-23 |