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VENKATESH S
DAVENPORT R
FOXHOVEN P
NULMAN J
Citation: S. Venkatesh et al., A STEADY-STATE THROUGHPUT ANALYSIS OF CLUSTER TOOLS - DUAL-BLADE VERSUS SINGLE-BLADE ROBOTS, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 418-424
Citation: Gq. Lu et al., CONTAMINATION CONTROL FOR GAS DELIVERY FROM A LIQUID SOURCE IN SEMICONDUCTOR MANUFACTURING, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 425-432
Citation: Yh. Fan et Tq. Qiu, ANALYSES OF THERMAL-STRESSES AND CONTROL SCHEMES FOR FAST TEMPERATURERAMPS OF BATCH FURNACES, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 433-437
Authors:
HIRASAWA S
SAITO Y
NEZU H
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MARUYAMA H
Citation: S. Hirasawa et al., ANALYSIS OF DRYING SHRINKAGE AND FLOW DUE TO SURFACE-TENSION OF SPIN-COATED FILMS ON TOPOGRAPHIC SUBSTRATES, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 438-444
Citation: Ds. Gibson et al., STATISTICALLY BASED PARAMETRIC YIELD PREDICTION FOR INTEGRATED-CIRCUITS, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 445-458
Citation: M. Nikoonahad et al., DEFECT DETECTION ALGORITHM FOR WAFER INSPECTION BASED ON LASER-SCANNING, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 459-468
Authors:
SENGUPTA C
CAVALLARO JR
WILSON WL
TITTEL FK
Citation: C. Sengupta et al., AUTOMATED EVALUATION OF CRITICAL FEATURES IN VLSI LAYOUTS BASED ON PHOTOLITHOGRAPHIC SIMULATIONS, IEEE transactions on semiconductor manufacturing, 10(4), 1997, pp. 482-494
Citation: S. Leang et Cj. Spanos, A GENERAL EQUIPMENT DIAGNOSTIC SYSTEM AND ITS APPLICATION ON PHOTOLITHOGRAPHIC SEQUENCES, IEEE transactions on semiconductor manufacturing, 10(3), 1997, pp. 329-343
Citation: Dj. Friedman et al., MODEL-FREE ESTIMATION OF DEFECT CLUSTERING IN INTEGRATED-CIRCUIT FABRICATION, IEEE transactions on semiconductor manufacturing, 10(3), 1997, pp. 344-359
Citation: Ba. Peters et T. Yang, INTEGRATED FACILITY LAYOUT AND MATERIAL HANDLING-SYSTEM DESIGN IN SEMICONDUCTOR FABRICATION FACILITIES, IEEE transactions on semiconductor manufacturing, 10(3), 1997, pp. 360-369
Citation: Mv. Kumar et al., A TEST STRUCTURE ADVISER AND A COUPLED, LIBRARY-BASED TEST STRUCTURE LAYOUT AND TESTING ENVIRONMENT, IEEE transactions on semiconductor manufacturing, 10(3), 1997, pp. 370-383
Citation: Gq. Lu et al., POLYSILICON RTCVD PROCESS OPTIMIZATION FOR ENVIRONMENTALLY-CONSCIOUS MANUFACTURING, IEEE transactions on semiconductor manufacturing, 10(3), 1997, pp. 390-398
Citation: V. Mohindra et al., ABATEMENT OF PERFLUOROCOMPOUNDS (PFCS) IN A MICROWAVE TUBULAR REACTORUSING O-2 AS AN ADDITIVE GAS, IEEE transactions on semiconductor manufacturing, 10(3), 1997, pp. 399-411
Authors:
HIMENO T
HAZAMA H
YAEGASHI T
SAKUI K
KANDA K
ITOH Y
MIYAMOTO J
Citation: T. Himeno et al., QUICK ADDRESS DETECTION OF ANOMALOUS MEMORY CELLS IN A FLASH MEMORY TEST STRUCTURE, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 196-200
Citation: M. Vonarx et al., TEST STRUCTURES TO MEASURE THE SEEBECK COEFFICIENT OF CMOS IC POLYSILICON, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 201-208
Authors:
BASTOS J
STEYAERT MSJ
PERGOOT A
SANSEN WM
Citation: J. Bastos et al., INFLUENCE OF DIE ATTACHMENT ON MOS-TRANSISTOR MATCHING, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 209-218
Citation: Gv. Persiano et S. Bellone, TEST STRUCTURE DESIGN FOR THE EVALUATION OF CARRIER-CARRIER SCATTERING EFFECT ON HOLE AND ELECTRON MOBILITIES, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 219-227
Authors:
WATANABE H
KOMORI J
HIGASHITANI K
SEKINE M
KOYAMA H
Citation: H. Watanabe et al., A WAFER LEVEL MONITORING METHOD FOR PLASMA-CHARGING DAMAGE USING ANTENNA PMOSFET TEST STRUCTURE, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 228-232
Citation: P. Nouet et A. Toulouse, USE OF TEST STRUCTURES FOR CHARACTERIZATION AND MODELING OF INTER-LAYER AND INTRA-LAYER CAPACITANCES IN A CMOS PROCESS, IEEE transactions on semiconductor manufacturing, 10(2), 1997, pp. 233-241