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Results: 1-20 |
Results: 20

Authors: Barreca, D Morazzoni, F Rizzi, GA Scotti, R Tondello, E
Citation: D. Barreca et al., Molecular oxygen interaction with Bi2O3: a spectroscopic and spectromagnetic investigation, PHYS CHEM P, 3(9), 2001, pp. 1743-1749

Authors: Armelao, L Barreca, D Gross, S Tondello, E
Citation: L. Armelao et al., Nanoscale cobalt oxides thin films obtained by CVD and sol-gel routes, J PHYS IV, 11(PR3), 2001, pp. 437-444

Authors: Barreca, D Battiston, GA Casellato, U Gerbasi, R Roncari, E Tondello, E Zanella, P
Citation: D. Barreca et al., Nanophased ZrO2-CeO2 or TiO2-ZrO2-CeO2 films by CVD as catalysts for hydrocarbon complete combustion, J PHYS IV, 11(PR3), 2001, pp. 453-460

Authors: Barreca, D Battiston, GA Carta, G Gerbasi, R Rossetto, G Tondello, E Zanella, P
Citation: D. Barreca et al., Al2O3 growth optimisation using aluminium dimethylisopropoxide as precursor as a function of reaction conditions and reacting gases, J PHYS IV, 11(PR3), 2001, pp. 539-546

Authors: Barison, S Barreca, D Daolio, S Fabrizio, M Tondello, E
Citation: S. Barison et al., An investigation of cobalt oxide based nanocrystalline thin films by secondary ion mass spectrometry, RAP C MASS, 15(17), 2001, pp. 1621-1624

Authors: Barreca, D Massignan, C Daolio, S Fabrizio, M Piccirillo, C Armelao, L Tondello, E
Citation: D. Barreca et al., Composition and microstructure of cobalt oxide thin films obtained from a novel cobalt(II) precursor by chemical vapor deposition, CHEM MATER, 13(2), 2001, pp. 588-593

Authors: Losurdo, M Barreca, D Bruno, G Tondello, E
Citation: M. Losurdo et al., Spectroscopic ellipsometry investigation of V2O5 nanocrystalline thin films, THIN SOL FI, 384(1), 2001, pp. 58-64

Authors: Armelao, L Barreca, D Gross, S Martucci, A Tieto, M Tondello, E
Citation: L. Armelao et al., Cobalt oxide-based films: sol-gel synthesis and characterization, J NON-CRYST, 293, 2001, pp. 477-482

Authors: Di Noto, V Barreca, D Furlan, C Armelao, L
Citation: V. Di Noto et al., Zeolitic inorganic-organic polymer electrolytes: A material based on poly(ethylene glycol) 600, SnCl4 and K4Fe(CN)(6), POLYM ADV T, 11(3), 2000, pp. 108-121

Authors: Barreca, D Battiston, GA Gerbasi, R Tondello, E
Citation: D. Barreca et al., Al2O3 thin films from aluminium dimethylisopropoxide by metal-organic chemical vapour deposition, J MAT CHEM, 10(9), 2000, pp. 2127-2130

Authors: Barison, S Barreca, D Daolio, S Fabrizio, M Piccirillo, C
Citation: S. Barison et al., Secondary ion mass spectrometric investigation on ruthenium oxide systems:a comparison between poly- and nanocrystalline deposits, RAP C MASS, 14(14), 2000, pp. 1179-1183

Authors: Barreca, D Armelao, L Caccavale, F Di Noto, V Gregori, A Rizzi, GA Tondello, E
Citation: D. Barreca et al., Highly oriented V2O5 nanocrystalline thin films by plasma-enhanced chemical vapor deposition, CHEM MATER, 12(1), 2000, pp. 98-103

Authors: Barreca, D Benetollo, F Garon, S Tondello, E Zanella, P
Citation: D. Barreca et al., The chloro(diethylamino)dimethyltin dimer, ACT CRYST C, 56, 2000, pp. E290-E291

Authors: Losurdo, M Bruno, G Barreca, D Tondello, E
Citation: M. Losurdo et al., Dielectric function of V2O5 nanocrystalline films by spectroscopic ellipsometry: Characterization of microstructure, APPL PHYS L, 77(8), 2000, pp. 1129-1131

Authors: Barreca, D Garon, S Zanella, P Tondello, E
Citation: D. Barreca et al., MOCVD of SnO2 thin films from a new organometallic precursor, J PHYS IV, 9(P8), 1999, pp. 667-673

Authors: Barreca, D Battiston, GA Caccavalec, F di Noto, V Gerbasi, R Gregori, A Rizzi, GA Tiziani, A Tondello, E
Citation: D. Barreca et al., A PE-MOCVD route to V2O5 nanostructured thin films, J PHYS IV, 9(P8), 1999, pp. 529-536

Authors: Barreca, D Depero, LE Di Noto, V Rizzi, GA Sangaletti, L Tondello, E
Citation: D. Barreca et al., Thin films of bismuth vanadates with modifiable conduction properties, CHEM MATER, 11(2), 1999, pp. 255-261

Authors: Barreca, D Buchberger, A Daolio, S Depero, LE Fabrizio, M Morandini, F Rizzi, GA Sangaletti, L Tondello, E
Citation: D. Barreca et al., A Ru(II) eta(3)-allylic complex as a novel precursor for the CVD of Ru- and RuO2-nanostructured thin films, LANGMUIR, 15(13), 1999, pp. 4537-4543

Authors: Barreca, D Depero, LE Franzato, E Rizzi, GA Sangaletti, L Tondello, E Vettori, U
Citation: D. Barreca et al., Vanadyl precursors used to modify the properties of vanadium oxide thin films obtained by chemical vapor deposition, J ELCHEM SO, 146(2), 1999, pp. 551-558

Authors: Barreca, D Rizzi, GA Tondello, E
Citation: D. Barreca et al., A chemical vapour deposition route to MoO3-Bi2O3 thin films, THIN SOL FI, 333(1-2), 1998, pp. 35-40
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