Citation: J. Lozano et al., HIGH-RESOLUTION ELECTRON-ENERGY-LOSS SPECTROSCOPY EVIDENCE FOR ELECTRON-BEAM-INDUCED DECOMPOSITION OF TRIMETHYLSILANE ADSORBED ON SI(100), Applied surface science, 136(1-2), 1998, pp. 159-165
Citation: Pw. Wang et Jh. Craig, RADIATION EFFECTS OF 1.3 KEV ELECTRON AND 1.486 KEV X-RAY PHOTON ON TRIMETHYLSILANE DOPED SI(100) SURFACES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 141(1-4), 1998, pp. 223-227
Citation: C. Bater et al., EFFECTS OF LOW-ENERGY-ELECTRON IRRADIATION ON SUBMONOLAYER AMMONIA ADSORBED ON PT(111), Surface and interface analysis, 26(2), 1998, pp. 97-104
Authors:
AGUILERA AF
CAMPBELL JH
CRAIG JH
PANNELL KH
Citation: Af. Aguilera et al., ELECTRON-STIMULATED DESORPTION TOTAL CROSS-SECTION DETERMINATION FOR DIGERMANE ON SI(100), Surface and interface analysis, 26(2), 1998, pp. 105-108
Citation: Jh. Campbell et al., ELECTRON-IRRADIATION EFFECTS ON DIGERMANE ADSORBED ON SI(100) SURFACES, Applied surface science, 108(3), 1997, pp. 345-350
Citation: Mv. Ascherl et al., STUDY OF ELECTRON-BEAM EFFECTS ON TRIMETHYLSILANE COVERED SI(100), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(6), 1995, pp. 2721-2725
Authors:
WANG PW
BATER S
ZHANG LP
ASCHERL M
CRAIG JH
Citation: Pw. Wang et al., XPS INVESTIGATION OF ELECTRON-BEAM EFFECTS ON A TRIMETHYLSILANE DOSEDSI(100) SURFACE, Applied surface science, 90(4), 1995, pp. 413-417
Citation: J. Lozano et al., TPD AND ESD OF HYDROGEN FROM DISILANE COVERED SI(100), Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 100(2-3), 1995, pp. 407-410
Citation: Mw. Grant et al., SENSITIVITY OF ELECTRON-STIMULATED DESORPTION TO SURFACE OXYGEN ON RH(111) AND PT(111), Surface science, 344(1-2), 1995, pp. 70-76
Citation: Jh. Campbell et al., ELECTRON-STIMULATED AND THERMAL-DESORPTION STUDY OF TRIMETHYLSILANE FROM SI(100), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 2128-2133
Citation: Mv. Ascherl et al., AN ESD KINETIC-ENERGY DISTRIBUTION STUDY OF TRIMETHYLSILANE ADSORBED ON SI(100), Applied surface science, 74(1), 1994, pp. 121-127
Citation: Jh. Craig et al., ELECTRON DESORPTION STUDY OF HF ETCHED SI(100), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(3), 1993, pp. 554-556