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Results:
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Results: 20
Authors:
OJEDA F
CASTROGARCIA A
GOMEZALEIXANDRE C
ALBELLA JM
Citation: F. Ojeda et al., GROWTH-KINETICS OF CHEMICALLY VAPOR-DEPOSITED SIO2-FILMS FROM SILANE OXIDATION, Journal of materials research, 13(8), 1998, pp. 2308-2314
Authors:
GARCIA MM
JIMENEZ I
VAZQUEZ L
GOMEZALEIXANDRE C
ALBELLA JM
SANCHEZ O
TERMINELLO LJ
HIMPSEL FJ
Citation: Mm. Garcia et al., X-RAY-ABSORPTION SPECTROSCOPY AND ATOMIC-FORCE MICROSCOPY STUDY OF BIAS-ENHANCED NUCLEATION OF DIAMOND FILMS, Applied physics letters, 72(17), 1998, pp. 2105-2107
Authors:
PALACIO C
GOMEZALEIXANDRE C
DIAZ D
GARCIA MM
Citation: C. Palacio et al., CARBON NITRIDE THIN-FILMS FORMATION BY N-2(-IMPLANTATION() ION), Vacuum, 48(7-9), 1997, pp. 709-713
Authors:
GOMEZALEIXANDRE C
GARCIA MM
SANCHEZ O
ALBELLA JM
Citation: C. Gomezaleixandre et al., INFLUENCE OF OXYGEN ON THE NUCLEATION AND GROWTH OF DIAMOND FILMS, Thin solid films, 303(1-2), 1997, pp. 34-38
Authors:
SANCHEZGARRIDO O
GOMEZALEIXANDRE C
OLIAS JS
ALBELLA JM
HERNANDEZVELEZ M
GUTIERREZ FF
Citation: O. Sanchezgarrido et al., DIELECTRIC AND RAMAN-SPECTROSCOPY OF MWCVD DIAMOND THIN-FILMS, Journal of materials science. Materials in electronics, 7(4), 1996, pp. 297-303
PREPARATION OF SI-N-B FILMS BY CVD TECHNIQUES - EFFECT OF SIH4 ADDITION TO B2H6 AND NH3 GAS-MIXTURES
Authors:
ESSAFTI A
GOMEZALEIXANDRE C
ALBELLA JM
Citation: A. Essafti et al., PREPARATION OF SI-N-B FILMS BY CVD TECHNIQUES - EFFECT OF SIH4 ADDITION TO B2H6 AND NH3 GAS-MIXTURES, DIAMOND AND RELATED MATERIALS, 5(3-5), 1996, pp. 580-583
Authors:
ESSAFTI A
GOMEZALEIXANDRE C
FIERRO JLG
FERNANDEZ M
ALBELLA JM
Citation: A. Essafti et al., CHEMICAL-VAPOR-DEPOSITION SYNTHESIS AND CHARACTERIZATION OF CO-DEPOSITED SILICON-NITROGEN-BORON MATERIALS, Journal of materials research, 11(10), 1996, pp. 2565-2574
Authors:
POZA MMG
VELEZ MH
JIMENEZ J
GOMEZALEIXANDRE C
OLIAS JS
MONTES AB
ALBELLA JM
Citation: Mmg. Poza et al., CHARACTERIZATION OF BIAS ENHANCED MWCVD DIAMOND THIN-FILMS, Materials letters, 29(1-3), 1996, pp. 111-115
Authors:
GOMEZALEIXANDRE C
SANCHEZ O
VAZQUEZ L
GARCIA MM
ALBELLA JM
Citation: C. Gomezaleixandre et al., INFLUENCE OF METHANE CONCENTRATION ON THE NUCLEATION AND GROWTH-STAGES IN DIAMOND FILM DEPOSITION, Physica status solidi. a, Applied research, 154(1), 1996, pp. 23-32
Authors:
GOMEZALEIXANDRE C
ESSAFTI A
FERNANDEZ M
FIERRO JLG
ALBELLA JM
Citation: C. Gomezaleixandre et al., INFLUENCE OF DIBORANE FLOW RATE ON THE STRUCTURE AND STABILITY OF CVDBORON-NITRIDE FILMS, Journal of physical chemistry, 100(6), 1996, pp. 2148-2153
Authors:
GOMEZALEIXANDRE C
SANCHEZ O
ALBELLA JM
SANTISO J
FIGUERAS A
Citation: C. Gomezaleixandre et al., CVD OF COVALENT COMPOUNDS AND HIGH-T-C SUPERCONDUCTORS, Advanced materials, 7(2), 1995, pp. 111-119
Authors:
ALBELLA JM
GOMEZALEIXANDRE C
SANCHEZGARRIDO O
VAZQUEZ L
MARTINEZDUART JM
Citation: Jm. Albella et al., DEPOSITION OF DIAMOND AND BORON-NITRIDE FILMS BY PLASMA CHEMICAL-VAPOR-DEPOSITION, Surface & coatings technology, 70(2-3), 1995, pp. 163-174
Authors:
GOMEZ FJ
MARTINEZ J
GARRIDO J
GOMEZALEIXANDRE C
PIQUERAS J
Citation: Fj. Gomez et al., AMORPHOUS SIC LAYERS DEPOSITED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA- SPECTROSCOPIC ELLIPSOMETRIC MEASUREMENTS, Journal of non-crystalline solids, 191(1-2), 1995, pp. 164-173
Authors:
VAZQUEZ L
ALBELLA JM
SANCHEZ O
GOMEZALEIXANDRE C
MARTINEZDUART JM
Citation: L. Vazquez et al., NUCLEATION AND INITIAL-STAGES OF GROWTH OF DIAMOND FILMS ON SILICON, Scripta metallurgica et materialia, 31(8), 1994, pp. 1103-1108
Authors:
SANCHEZ O
GOMEZALEIXANDRE C
AGULLO F
ALBELLA JM
Citation: O. Sanchez et al., STUDY OF THE PLASMA DISCHARGES IN DIAMOND DEPOSITION WITH DIFFERENT O2 CONCENTRATIONS, DIAMOND AND RELATED MATERIALS, 3(9), 1994, pp. 1183-1187
Authors:
SANCHEZ O
GARCIA MM
VAZQUEZ L
GOMEZALEIXANDRE C
Citation: O. Sanchez et al., INFLUENCE OF OXYGEN ON THE DEPOSITION OF DIAMOND COATINGS BY MICROWAVE PLASMA CVD, Vacuum, 45(10-11), 1994, pp. 1015-1016
Authors:
HERNANDEZ MJ
GOMEZ FJ
GARRIDO J
PIQUERAS J
GOMEZALEIXANDRE C
Citation: Mj. Hernandez et al., ELECTRON-CYCLOTRON-RESONANCE PLASMA DEPOSITION AS A PROMISING TECHNIQUE FOR LOW-TEMPERATURE HARD COATINGS, Vacuum, 45(10-11), 1994, pp. 1023-1025
Authors:
ESSAFTI A
GOMEZALEIXANDRE C
ALBELLA JM
Citation: A. Essafti et al., STUDY OF BORON-NITRIDE DEPOSITION PROCESS FROM DIBORANE AND AMMONIA GAS-MIXTURES, Vacuum, 45(10-11), 1994, pp. 1029-1030
Authors:
GOMEZALEIXANDRE C
DIAZ D
ORGAZ F
ALBELLA JM
Citation: C. Gomezaleixandre et al., REACTION OF DIBORANE AND AMMONIA GAS-MIXTURES IN A CHEMICAL-VAPOR-DEPOSITION HOT-WALL REACTOR, Journal of physical chemistry, 97(42), 1993, pp. 11043-11046
Authors:
GOMEZALEIXANDRE C
SANCHEZ O
CASTRO A
ALBELLA JM
Citation: C. Gomezaleixandre et al., OPTICAL-EMISSION CHARACTERIZATION OF CH4+H2 DISCHARGES FOR DIAMOND DEPOSITION, Journal of applied physics, 74(6), 1993, pp. 3752-3757
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