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Results: 1-18 |
Results: 18
PRELIMINARY TOXICOKINETIC STUDY WITH DIFFERENT CRYSTAL FORMS OF S(-IBUPROFEN (DEXIBUPROFEN) AND R,S-IBUPROFEN IN RATS())
Authors: WALSER S HRUBY R HESSE E HEINZL H MASCHER H
Citation: S. Walser et al., PRELIMINARY TOXICOKINETIC STUDY WITH DIFFERENT CRYSTAL FORMS OF S(-IBUPROFEN (DEXIBUPROFEN) AND R,S-IBUPROFEN IN RATS()), Arzneimittel-Forschung, 47(6), 1997, pp. 750-754
SHAPE OF A CO-ND LIQUID ALLOY ION-SOURCE
Authors: HESSE E DRIESEL W DIETZSCH C BISCHOFF L TEICHERT J
Citation: E. Hesse et al., SHAPE OF A CO-ND LIQUID ALLOY ION-SOURCE, JPN J A P 1, 35(10), 1996, pp. 5564-5570
IN-SITU OBSERVATION OF THE TIP SHAPE OF CO-GE LIQUID ALLOY ION SOURCES IN A HIGH-VOLTAGE TRANSMISSION ELECTRON-MICROSCOPE
Authors: DRIESEL W DIETZSCH C HESSE E BISCHOFF L TEICHERT J
Citation: W. Driesel et al., IN-SITU OBSERVATION OF THE TIP SHAPE OF CO-GE LIQUID ALLOY ION SOURCES IN A HIGH-VOLTAGE TRANSMISSION ELECTRON-MICROSCOPE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 1621-1629
COBALT DISILICIDE INTERCONNECTS FOR MICROMECHANICAL DEVICES
Authors: TEICHERT J BISCHOFF L HESSE E SCHNEIDER P PANKNIN D GESSNER T LOBNER B ZICHNER N
Citation: J. Teichert et al., COBALT DISILICIDE INTERCONNECTS FOR MICROMECHANICAL DEVICES, Journal of micromechanics and microengineering, 6(2), 1996, pp. 272-278
FOCUSED ION-BEAM SPUTTERING YIELD MEASUREMENTS FOR COBALT IONS ON SILICON AND RELATED MATERIALS
Authors: SCHNEIDER P BISCHOFF L TEICHERT J HESSE E
Citation: P. Schneider et al., FOCUSED ION-BEAM SPUTTERING YIELD MEASUREMENTS FOR COBALT IONS ON SILICON AND RELATED MATERIALS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 117(1-2), 1996, pp. 77-80
CLUSTER BEAMS FROM A CO-ND LIQUID ALLOY ION-SOURCE
Authors: BISCHOFF L TEICHERT J HESSE E PREWETT PD WATSON JG
Citation: L. Bischoff et al., CLUSTER BEAMS FROM A CO-ND LIQUID ALLOY ION-SOURCE, Microelectronic engineering, 30(1-4), 1996, pp. 245-248
THE ROLE OF THE ADULT ATTACHMENT INTERVIEW IN PARENT-INFANT PSYCHOTHERAPY - A CASE PRESENTATION
Authors: MINDE K HESSE E
Citation: K. Minde et E. Hesse, THE ROLE OF THE ADULT ATTACHMENT INTERVIEW IN PARENT-INFANT PSYCHOTHERAPY - A CASE PRESENTATION, Infant mental health journal, 17(2), 1996, pp. 115-126
DISCOURSE, MEMORY, AND THE ADULT ATTACHMENT INTERVIEW - A NOTE WITH EMPHASIS ON THE EMERGING CANNOT CLASSIFY CATEGORY
Authors: HESSE E
Citation: E. Hesse, DISCOURSE, MEMORY, AND THE ADULT ATTACHMENT INTERVIEW - A NOTE WITH EMPHASIS ON THE EMERGING CANNOT CLASSIFY CATEGORY, Infant mental health journal, 17(1), 1996, pp. 4-11
PARAMETRIC INVESTIGATION OF CURRENT PULSES IN A LIQUID-METAL ION EMITTER
Authors: HESSE E MAIR GLR BISCHOFF L TEICHERT J
Citation: E. Hesse et al., PARAMETRIC INVESTIGATION OF CURRENT PULSES IN A LIQUID-METAL ION EMITTER, Journal of physics. D, Applied physics, 29(8), 1996, pp. 2193-2197
COMPARISON OF COSI2 INTERCONNECTION LINES ON CRYSTALLINE AND NONCRYSTALLINE SILICON FABRICATED BY WRITING FOCUSED ION-BEAM IMPLANTATION
Authors: TEICHERT J BISCHOFF L HESSE E SCHNEIDER P PANKNIN D GESSNER T LOBNER B ZICHNER N
Citation: J. Teichert et al., COMPARISON OF COSI2 INTERCONNECTION LINES ON CRYSTALLINE AND NONCRYSTALLINE SILICON FABRICATED BY WRITING FOCUSED ION-BEAM IMPLANTATION, Applied surface science, 91(1-4), 1995, pp. 44-49
INTERCONNECTION LINES FOLLOWING THE SURFACE-TOPOGRAPHY FABRICATED BY WRITING FOCUSED ION-BEAM IMPLANTATION
Authors: BISCHOFF L TEICHERT J HESSE E
Citation: L. Bischoff et al., INTERCONNECTION LINES FOLLOWING THE SURFACE-TOPOGRAPHY FABRICATED BY WRITING FOCUSED ION-BEAM IMPLANTATION, Microelectronic engineering, 27(1-4), 1995, pp. 351-354
ANGULAR-DISTRIBUTION AND ENERGY SPREAD OF A LITHIUM LIQUID-METAL ION-SOURCE
Authors: HESSE E BISCHOFF L TEICHERT J
Citation: E. Hesse et al., ANGULAR-DISTRIBUTION AND ENERGY SPREAD OF A LITHIUM LIQUID-METAL ION-SOURCE, Journal of physics. D, Applied physics, 28(8), 1995, pp. 1707-1709
COSI2 MICROSTRUCTURES BY MEANS OF A HIGH-CURRENT FOCUSED ION-BEAM
Authors: BISCHOFF L TEICHERT J HESSE E PANKNIN D SKORUPA W
Citation: L. Bischoff et al., COSI2 MICROSTRUCTURES BY MEANS OF A HIGH-CURRENT FOCUSED ION-BEAM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3523-3527
A LITHIUM LIQUID-METAL ION-SOURCE WITH A NARROW-ANGLE EMISSION FOR WRITING BEAM LITHOGRAPHY
Authors: HESSE E NAEHRING FK TEICHERT J
Citation: E. Hesse et al., A LITHIUM LIQUID-METAL ION-SOURCE WITH A NARROW-ANGLE EMISSION FOR WRITING BEAM LITHOGRAPHY, Microelectronic engineering, 23(1-4), 1994, pp. 111-114
WRITING IMPLANTATION WITH A HIGH-CURRENT DENSITY FOCUSED ION-BEAM
Authors: BISCHOFF L HESSE E PANKNIN D SKORUPA W TEICHERT J
Citation: L. Bischoff et al., WRITING IMPLANTATION WITH A HIGH-CURRENT DENSITY FOCUSED ION-BEAM, Microelectronic engineering, 23(1-4), 1994, pp. 115-118
DEVELOPMENT OF A COBALT LIQUID ALLOY ION-SOURCE
Authors: HESSE E BISCHOFF L TEICHERT J
Citation: E. Hesse et al., DEVELOPMENT OF A COBALT LIQUID ALLOY ION-SOURCE, Journal of physics. D, Applied physics, 27(2), 1994, pp. 427-428
HIGH-CURRENT FIB SYSTEM FOR MICROMECHANICS APPLICATION
Authors: BISCHOFF L HESSE E HOFMANN G NAEHRING FK PROBST W SCHMIDT B TEICHERT J
Citation: L. Bischoff et al., HIGH-CURRENT FIB SYSTEM FOR MICROMECHANICS APPLICATION, Microelectronic engineering, 21(1-4), 1993, pp. 197-200
NARROW ANGLE EMISSION FROM A LITHIUM LIQUID-METAL ION-SOURCE
Authors: HESSE E NAEHRING FK
Citation: E. Hesse et Fk. Naehring, NARROW ANGLE EMISSION FROM A LITHIUM LIQUID-METAL ION-SOURCE, Journal of physics. D, Applied physics, 26(4), 1993, pp. 717-718
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