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Results: 1-25/62
Authors:
FUKUMI K
KAGEYAMA H
KADONO K
CHAYAHARA A
KAMIJO N
MAKIHARA M
FUJII K
HAYAKAWA J
SATOU M
Citation: K. Fukumi et al., X-RAY-ABSORPTION FINE-STRUCTURE STUDY ON COORDINATION STATE OF IMPLANTED GOLD IONS IN SILICA GLASS, Journal of materials research, 13(9), 1998, pp. 2649-2654
Authors:
YUKIMURA K
OHNO K
KOTO M
KUROOKA S
SUZUKI Y
KINOMURA A
CHAYAHARA A
HORINO Y
Citation: K. Yukimura et al., TITANIUM ION-IMPLANTATION INTO SILICON SUBSTRATE BY PLASMA-BASED METAL-ION IMPLANTATION SYSTEM WITH 100-KV 2.5-A PULSE MODULATOR/, Surface & coatings technology, 104, 1998, pp. 252-256
Authors:
KOTO M
OHNO K
YOSHIKADO S
YUKIMURA K
KUROOKA S
SUZUKI Y
KINOMURA A
CHAYAHARA A
HORINO Y
Citation: M. Koto et al., TITANIUM IMPLANTATION PROFILES IN SILICON USING METAL PLASMA-BASED ION-IMPLANTATION TECHNIQUE, Materials chemistry and physics, 54(1-3), 1998, pp. 127-130
Authors:
HECK C
HORINO Y
TSUBOUCHI N
CHAYAHARA A
FUJII K
IWAMI M
ABIKO K
Citation: C. Heck et al., THIN-FILMS FORMED BY SINGLE AND DUAL-ION BEAM DEPOSITION OF POSITIVE AND NEGATIVE-IONS (AU- AND N+), Materials chemistry and physics, 54(1-3), 1998, pp. 247-250
Authors:
TSUBOUCHI N
HORINO Y
ENDERS B
CHAYAHARA A
KINOMURA A
FUJII K
Citation: N. Tsubouchi et al., CHARACTERIZATION OF CARBON NITRIDE FILMS PRODUCED BY SIMULTANEOUS LOW-ENERGY DUAL-ION BEAMS IRRADIATION, Materials chemistry and physics, 54(1-3), 1998, pp. 325-329
Authors:
KIUCHI M
CHAYAHARA A
TARUTANI M
TAKAI Y
SHIMIZU R
Citation: M. Kiuchi et al., THE MICROSTRUCTURE OF TRANSPARENT AND ELECTRICALLY CONDUCTING TITANIUM NITRIDE FILMS, Materials chemistry and physics, 54(1-3), 1998, pp. 330-333
Authors:
FUKUMI K
CHAYAHARA A
KITAMURA N
NISHII J
HORINO Y
MAKIHARA M
FUJII K
HAYAKAWA J
Citation: K. Fukumi et al., STRUCTURAL RELAXATION OF MEV ION-IMPLANTED SILICA GLASSES BY THERMAL ANNEALING, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 141(1-4), 1998, pp. 620-624
Authors:
MOKUNO Y
HORINO Y
TADIC T
TERASAWA M
SEKIOKA T
CHAYAHARA A
KINOMURA A
TSUBOUCHI N
FUJII K
Citation: Y. Mokuno et al., HIGH-ENERGY RESOLUTION PIXE ANALYSIS USING FOCUSED MEV HEAVY-ION BEAMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 138, 1998, pp. 368-372
Authors:
CHAYAHARA A
HORINO Y
TSUBOUCHI N
KINOMURA A
FUJII K
Citation: A. Chayahara et al., APPROACH TO FORMATION OF ULTRA-PURE METAL-FILMS BY MEANS OF ION-BEAM TECHNOLOGY, Physica status solidi. a, Applied research, 167(2), 1998, pp. 405-410
Authors:
FUKUMI K
CHAYAHARA A
KADONO K
KAGEYAMA H
AKAI T
KITAMURA N
MAKIHARA M
FUJII K
HAYAKAWA J
Citation: K. Fukumi et al., STRUCTURAL INVESTIGATION ON IMPLANTED COPPER IONS IN SILICA GLASS BY XAFS SPECTROSCOPY, Journal of non-crystalline solids, 238(1-2), 1998, pp. 143-151
Authors:
TSUBOUCHI N
HORINO Y
ENDERS B
CHAYAHARA A
KINOMURA A
FUJII K
Citation: N. Tsubouchi et al., KINETIC-ENERGY INFLUENCE OF HYPERTHERMAL DUAL-ION BEAMS ON BONDING AND OPTICAL-PROPERTIES OF CARBON NITRIDE FILMS, Applied physics letters, 72(12), 1998, pp. 1412-1414
Authors:
MOKUNO Y
HORINO Y
CHAYAHARA A
KINOMURA A
TSUBOUCHI N
FUJII K
TERASAWA M
SEKIOKA T
MITAMURA T
Citation: Y. Mokuno et al., HIGH-ENERGY RESOLUTION PIXE WITH HIGH-EFFICIENCY USING THE HEAVY-ION MICROBEAM, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 130(1-4), 1997, pp. 243-246
Authors:
ENDERS B
HORINO Y
TSUBOUCHI N
CHAYAHARA A
KINOMURA A
FUJII K
Citation: B. Enders et al., CARBON NITRIDE THIN-FILMS FORMED BY LOW-ENERGY ION-BEAM DEPOSITION WITH POSITIVE AND NEGATIVE-IONS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 73-78
Authors:
NAGASAKA H
CHAYAHARA A
FUJII K
Citation: H. Nagasaka et al., TRIBOLOGICAL PROPERTIES OF TITANIUM NITRIDE FILMS PREPARED BY DYNAMICION-BEAM MIXING METHOD, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 279-282
Authors:
IKEYAMA M
TANAKA T
CHAYAHARA A
CLISSOLD RA
WIELUNSKI LS
SWAIN MV
Citation: M. Ikeyama et al., ULTRAMICROHARDNESS MEASUREMENT OF ION-IMPLANTED ALUMINA, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 335-339
Authors:
CHECCHETTO R
CHAYAHARA A
HORINO H
MIOTELLO A
FUJII K
Citation: R. Checchetto et al., A STUDY OF DEUTERIUM PERMEATION THROUGH THIN BN FILMS, Thin solid films, 299(1-2), 1997, pp. 5-9
Authors:
HORINO Y
TSUBOUCHI N
ENDERS B
HECK C
CHAYAHARA A
KINOMURA A
FUJII K
Citation: Y. Horino et al., DEVELOPMENT OF A NEW ION-BEAM DEPOSITION TECHNOLOGY FOR ULTRA-HIGH-PURITY FILM FABRICATION, Physica status solidi. a, Applied research, 160(2), 1997, pp. 583-589
Authors:
HECK C
CHAYAHARA A
TSUBOUCHI N
HORINO Y
FUJII K
IWAMI M
ABIKO K
Citation: C. Heck et al., FORMATION OF THIN AU FILMS USING NEGATIVE-ION-BEAM DEPOSITION, Physica status solidi. a, Applied research, 160(2), 1997, pp. 591-597
Authors:
INOUE S
UCHIDA H
OHBA T
KOTERAZAWA K
CHAYAHARA A
TERASAWA M
Citation: S. Inoue et al., DYNAMIC PROCESS-CONTROL OF RF REACTIVE SP UTTERING BY MONITORING PLASMA EMISSION INTENSITY, Nippon Kinzoku Gakkaishi, 61(10), 1997, pp. 1108-1114
Authors:
SAKAGUCHI M
YOKOTA K
SHIOMI A
MORI H
CHAYAHARA A
FUJII Y
HIRAI K
TAKANO H
KUMAGAI M
Citation: M. Sakaguchi et al., DIFFUSIVITIES AND ACTIVITIES OF S IMPLANTED INTO GAAS THROUGH AN AS-DOPED A-SI-H FILM, JPN J A P 1, 35(3), 1996, pp. 1624-1629
Authors:
FUJII F
HORINO Y
TSUBOUCHI N
ENDERS B
CHAYAHARA A
KINOMURA A
Citation: F. Fujii et al., ION-BEAM DEPOSITION WITH POSITIVE AND NEGATIVE-IONS, Surface & coatings technology, 84(1-3), 1996, pp. 544-549
Authors:
NISHII J
CHAYAHARA A
FUKUMI K
FUJII K
YAMANAKA H
HOSONO H
KAWAZOE H
Citation: J. Nishii et al., COMPARISON OF FORMATION PROCESS OF ULTRAVIOLET-INDUCED COLOR-CENTERS IN GEO2-SIO2 GLASS-FIBER PREFORM AND GE-IMPLANTED SIO2, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 116(1-4), 1996, pp. 150-153
Authors:
MOKUNO Y
HORINO Y
KINOMURA A
CHAYAHARA A
TSUBOUCHI N
FUJII K
Citation: Y. Mokuno et al., PIXE ANALYSIS OF HEAVY-ELEMENTS IN SILICON USING MEV HEAVY-ION BEAMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 109, 1996, pp. 573-575
Authors:
FUKUMI K
CHAYAHARA A
KITAMURA N
NISHII J
KADONO K
MAKIHARA M
FUJII K
HAYAKAWA J
Citation: K. Fukumi et al., REFRACTIVE-INDEX CHANGE IN AL-ION-IMPLANTED SILICA GLASS(), Journal of applied physics, 79(2), 1996, pp. 1060-1064
Authors:
FUKUMI K
KAGEYAMA H
KADONO K
CHAYAHARA A
KAMIJO N
MAKIHARA M
FUJII K
HAYAKAWA J
SATOU M
Citation: K. Fukumi et al., STRUCTURE OF AU ULTRAFINE PARTICLES IN SILICA GLASS BY X-RAY-ABSORPTION FINE-STRUCTURE SPECTROSCOPY, Journal of materials research, 10(10), 1995, pp. 2418-2421