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Results: 1-25 | 26-34
Results: 1-25/34
A NOVEL THIN GATE-OXIDE-THICKNESS MEASUREMENT METHOD BY LDD (LIGHTLY-DOPED-DRAIN)-NMOS (N-CHANNEL METAL-OXIDE-SEMICONDUCTOR) TRANSISTORS
Authors: SHIH JR LEE JH LIEW BK HWANG HL
Citation: Jr. Shih et al., A NOVEL THIN GATE-OXIDE-THICKNESS MEASUREMENT METHOD BY LDD (LIGHTLY-DOPED-DRAIN)-NMOS (N-CHANNEL METAL-OXIDE-SEMICONDUCTOR) TRANSISTORS, JPN J A P 2, 37(1AB), 1998, pp. 1-3
PROPERTIES AND RELIABILITY OF ULTRATHIN OXIDES GROWN ON 4-INCH DIAMETER SILICON-WAFERS BY MICROWAVE PLASMA AFTERGLOW OXIDATION
Authors: CHEN CR HU SF CHEN PC HWANG HL HSIA LC
Citation: Cr. Chen et al., PROPERTIES AND RELIABILITY OF ULTRATHIN OXIDES GROWN ON 4-INCH DIAMETER SILICON-WAFERS BY MICROWAVE PLASMA AFTERGLOW OXIDATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2712-2719
OUTLOOK FOR PHOTOVOLTAIC DEVELOPMENTS IN TAIWAN
Authors: HWANG HL HSU KYJ LEE WI SHING YH HSU KC TSENG BH
Citation: Hl. Hwang et al., OUTLOOK FOR PHOTOVOLTAIC DEVELOPMENTS IN TAIWAN, Progress in photovoltaics, 6(3), 1998, pp. 201-206
CYCLOADDITION OF TUNGSTEN-ETA(1)-3-FURYL COMPOUNDS WITH ALKENES AND ALKYNES - SYNTHESES AND RING-CLEAVAGE OF TUNGSTEN-ETA(1)-OXABICYCLOHEPTENE AND TUNGSTEN-ETA(1)-OXABICYCLOHEPTADIENE COMPOUNDS
Authors: SHIU LH SHU HK CHENG DH HWANG HL WANG SL LIAO FL LIU RS
Citation: Lh. Shiu et al., CYCLOADDITION OF TUNGSTEN-ETA(1)-3-FURYL COMPOUNDS WITH ALKENES AND ALKYNES - SYNTHESES AND RING-CLEAVAGE OF TUNGSTEN-ETA(1)-OXABICYCLOHEPTENE AND TUNGSTEN-ETA(1)-OXABICYCLOHEPTADIENE COMPOUNDS, Organometallics, 17(19), 1998, pp. 4206-4212
MODIFICATION OF SURFACE AND BANDGAP ON SB-INCORPORATED CUINSE2 THIN-FILMS BY (NH4)(2)S-X SULFURIZATION
Authors: CHENG YH TSENG BH HWANG HL
Citation: Yh. Cheng et al., MODIFICATION OF SURFACE AND BANDGAP ON SB-INCORPORATED CUINSE2 THIN-FILMS BY (NH4)(2)S-X SULFURIZATION, Applied surface science, 123, 1998, pp. 603-609
MICROSTRUCTURE EVOLUTION OF HYDROGENATED SILICON THIN-FILMS AT DIFFERENT HYDROGEN INCORPORATION
Authors: HWANG HL WANG KC HSU KC WANG RY YEW TR LOFERSKI JJ
Citation: Hl. Hwang et al., MICROSTRUCTURE EVOLUTION OF HYDROGENATED SILICON THIN-FILMS AT DIFFERENT HYDROGEN INCORPORATION, Applied surface science, 114, 1997, pp. 741-749
CHARACTERIZATION OF POROUS SILICON-ON-INSULATOR FILMS PREPARED BY ANODIC-OXIDATION (VOL 276, PG 147, 1996)
Authors: LEE CH YEH CC HWANG HL HSU KYJ
Citation: Ch. Lee et al., CHARACTERIZATION OF POROUS SILICON-ON-INSULATOR FILMS PREPARED BY ANODIC-OXIDATION (VOL 276, PG 147, 1996), Thin solid films, 293(1-2), 1997, pp. 334-334
LOFERSKI,JOSEPH,JOHN
Authors: HWANG HL
Citation: Hl. Hwang, LOFERSKI,JOSEPH,JOHN, Physics today, 50(7), 1997, pp. 80-80
MICROSTRUCTURE EVOLUTION OF HYDROGENATED SILICON THIN-FILMS
Authors: HWANG HL WANG KC HSU KC YEW TR LOFERSKI JJ
Citation: Hl. Hwang et al., MICROSTRUCTURE EVOLUTION OF HYDROGENATED SILICON THIN-FILMS, Progress in photovoltaics, 4(3), 1996, pp. 165-192
TENSILE BOND STRENGTHS OF DEFORMED BARS OF HIGH-STRENGTH CONCRETE
Authors: HWANG SJ LEU YR HWANG HL
Citation: Sj. Hwang et al., TENSILE BOND STRENGTHS OF DEFORMED BARS OF HIGH-STRENGTH CONCRETE, ACI structural journal, 93(1), 1996, pp. 11-20
PROCEEDINGS OF THE 7TH INTERNATIONAL-CONFERENCE ON SOLID FILMS AND SURFACES - HSINCHU, TAIWAN, ROC, DECEMBER 12-16, 1994 - PREFACE
Authors: HWANG HL TSONG TT
Citation: Hl. Hwang et Tt. Tsong, PROCEEDINGS OF THE 7TH INTERNATIONAL-CONFERENCE ON SOLID FILMS AND SURFACES - HSINCHU, TAIWAN, ROC, DECEMBER 12-16, 1994 - PREFACE, Applied surface science, 92, 1996, pp. 7-7
VERY-LOW TEMPERATURE POLYCRYSTALLINE SILICON FILMS WITH VERY LARGE GRAINS DEPOSITED FOR THIN-FILM-TRANSISTOR APPLICATIONS
Authors: WANG KC YEW TR HWANG HL
Citation: Kc. Wang et al., VERY-LOW TEMPERATURE POLYCRYSTALLINE SILICON FILMS WITH VERY LARGE GRAINS DEPOSITED FOR THIN-FILM-TRANSISTOR APPLICATIONS, Applied surface science, 92, 1996, pp. 99-105
ULTRA-THIN GATE DIELECTRICS GROWN BY LOW-TEMPERATURE PROCESSES FOR APPLICATIONS TO ULSI DEVICES
Authors: HWANG HL CHEN PC HSU KYJ
Citation: Hl. Hwang et al., ULTRA-THIN GATE DIELECTRICS GROWN BY LOW-TEMPERATURE PROCESSES FOR APPLICATIONS TO ULSI DEVICES, Applied surface science, 92, 1996, pp. 180-192
AES AND SRUPS STUDIES ON SURFACE PASSIVATION OF GAAS BY (NH4)(2)S-X SULFURIZATION TECHNIQUES
Authors: HSIEH JT HWANG HL
Citation: Jt. Hsieh et Hl. Hwang, AES AND SRUPS STUDIES ON SURFACE PASSIVATION OF GAAS BY (NH4)(2)S-X SULFURIZATION TECHNIQUES, Applied surface science, 92, 1996, pp. 222-226
RELIABILITY STUDY OF SUBMICRON TITANIUM SILICIDE CONTACTS
Authors: LIN CC CHEN WS HWANG HL HSU KYJ LIOU HK TU KN
Citation: Cc. Lin et al., RELIABILITY STUDY OF SUBMICRON TITANIUM SILICIDE CONTACTS, Applied surface science, 92, 1996, pp. 660-664
STUDIES ON LOW-TEMPERATURE SILICON GRAIN-GROWTH ON SIO2 BY ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION
Authors: WANG KC HWANG HL LOFERSKI JJ YEW TR
Citation: Kc. Wang et al., STUDIES ON LOW-TEMPERATURE SILICON GRAIN-GROWTH ON SIO2 BY ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION, Applied surface science, 104, 1996, pp. 373-378
CHARACTERIZATION OF POROUS SILICON-ON-INSULATOR FILMS PREPARED BY ANODIC-OXIDATION
Authors: LEE CH YEH CC HWANG HL HSU KYJ
Citation: Ch. Lee et al., CHARACTERIZATION OF POROUS SILICON-ON-INSULATOR FILMS PREPARED BY ANODIC-OXIDATION, Thin solid films, 276(1-2), 1996, pp. 147-150
FUNDAMENTAL-STUDIES OF P-TYPE DOPING OF CDTE
Authors: HWANG HL HSU KYJ UENG HY
Citation: Hl. Hwang et al., FUNDAMENTAL-STUDIES OF P-TYPE DOPING OF CDTE, Journal of crystal growth, 161(1-4), 1996, pp. 73-81
VERY-LOW TEMPERATURE DEPOSITION OF POLYCRYSTALLINE SI FILMS FABRICATED BY HYDROGEN DILUTION WITH ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION
Authors: WANG KC CHENG KL JIANG YL YEW TR HWANG HL
Citation: Kc. Wang et al., VERY-LOW TEMPERATURE DEPOSITION OF POLYCRYSTALLINE SI FILMS FABRICATED BY HYDROGEN DILUTION WITH ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 34(2B), 1995, pp. 927-931
CHARACTERIZATION OF ULTRATHIN DIELECTRICS GROWN BY MICROWAVE AFTERGLOW OXYGEN AND N2O PLASMA
Authors: CHEN PC HSU KYJ LIN JY HWANG HL
Citation: Pc. Chen et al., CHARACTERIZATION OF ULTRATHIN DIELECTRICS GROWN BY MICROWAVE AFTERGLOW OXYGEN AND N2O PLASMA, JPN J A P 1, 34(2B), 1995, pp. 973-977
EVALUATION OF NI-IN-NI MULTILAYERS FOR THERMALLY STABLE OHMIC CONTACTS TO N-GAAS
Authors: HSIA ST LEE CP HWANG HL
Citation: St. Hsia et al., EVALUATION OF NI-IN-NI MULTILAYERS FOR THERMALLY STABLE OHMIC CONTACTS TO N-GAAS, Materials science & engineering. B, Solid-state materials for advanced technology, 33(2-3), 1995, pp. 178-181
A LATERAL INJECTION POROUS SILICON DEVICE STRUCTURE FOR LIGHT-EMITTING-DIODES
Authors: YEH CC LEE CH HWANG HL HSU KYJ
Citation: Cc. Yeh et al., A LATERAL INJECTION POROUS SILICON DEVICE STRUCTURE FOR LIGHT-EMITTING-DIODES, Thin solid films, 255(1-2), 1995, pp. 262-265
STOICHIOMETRIC CONTROL OF CUINSE2 THIN-FILMS USING A MOLECULAR-BEAM EPITAXY TECHNIQUE
Authors: TSENG BH LIN SB HSIEH KC HWANG HL
Citation: Bh. Tseng et al., STOICHIOMETRIC CONTROL OF CUINSE2 THIN-FILMS USING A MOLECULAR-BEAM EPITAXY TECHNIQUE, Journal of crystal growth, 150(1-4), 1995, pp. 1206-1210
MICROSTRUCTURES OF LOW-TEMPERATURE-DEPOSITED POLYCRYSTALLINE SILICON WITH MICROMETER GRAINS
Authors: WANG KC HWANG HL LEONG PT YEW TR
Citation: Kc. Wang et al., MICROSTRUCTURES OF LOW-TEMPERATURE-DEPOSITED POLYCRYSTALLINE SILICON WITH MICROMETER GRAINS, Journal of applied physics, 77(12), 1995, pp. 6542-6548
THIN-FILM TRANSISTORS MADE FROM HYDROGENATED MICROCRYSTALLINE SILICON
Authors: HSU KC CHEN BY HSU HT WANG KC YEW TR HWANG HL
Citation: Kc. Hsu et al., THIN-FILM TRANSISTORS MADE FROM HYDROGENATED MICROCRYSTALLINE SILICON, JPN J A P 1, 33(1B), 1994, pp. 639-642
Risultati: 1-25 | 26-34