AAAAAA

   
Results: 1-24 |
Results: 24
ATOMIC-FORCE MICROSCOPE-BASED DATA-STORAGE - TRACK SERVO AND WEAR STUDY
Authors: TERRIS BD RISHTON SA MAMIN HJ RIED RP RUGAR D
Citation: Bd. Terris et al., ATOMIC-FORCE MICROSCOPE-BASED DATA-STORAGE - TRACK SERVO AND WEAR STUDY, Applied physics A: Materials science & processing, 66, 1998, pp. 809-813
NEW COMPLIMENTARY METAL-OXIDE-SEMICONDUCTOR TECHNOLOGY WITH SELF-ALIGNED SCHOTTKY SOURCE DRAIN AND LOW-RESISTANCE T-GATES/
Authors: RISHTON SA ISMAIL K CHU JO CHAN KK LEE KY
Citation: Sa. Rishton et al., NEW COMPLIMENTARY METAL-OXIDE-SEMICONDUCTOR TECHNOLOGY WITH SELF-ALIGNED SCHOTTKY SOURCE DRAIN AND LOW-RESISTANCE T-GATES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2795-2798
ATOMIC-FORCE MICROSCOPE-BASED DATA-STORAGE USING REPLICATED MEDIA
Authors: TERRIS BD RISHTON SA MAMIN HJ BEST ME LOGAN JA RUGAR D
Citation: Bd. Terris et al., ATOMIC-FORCE MICROSCOPE-BASED DATA-STORAGE USING REPLICATED MEDIA, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 1584-1587
MAGNETIC TUNNEL-JUNCTIONS FABRICATED AT 10TH-MICRON DIMENSIONS BY ELECTRON-BEAM LITHOGRAPHY
Authors: RISHTON SA LU Y ALTMAN RA MARLEY AC BIAN XP JAHNES C VISWANATHAN R XIAO G GALLAGHER WJ PARKIN SSP
Citation: Sa. Rishton et al., MAGNETIC TUNNEL-JUNCTIONS FABRICATED AT 10TH-MICRON DIMENSIONS BY ELECTRON-BEAM LITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 249-252
AN MOS-TRANSISTOR WITH SCHOTTKY SOURCE DRAIN CONTACTS AND A SELF-ALIGNED LOW-RESISTANCE T-GATE/
Authors: RISHTON SA ISMAIL K CHU JO CHAN K
Citation: Sa. Rishton et al., AN MOS-TRANSISTOR WITH SCHOTTKY SOURCE DRAIN CONTACTS AND A SELF-ALIGNED LOW-RESISTANCE T-GATE/, Microelectronic engineering, 35(1-4), 1997, pp. 361-363
MICROSTRUCTURED MAGNETIC TUNNEL-JUNCTIONS
Authors: GALLAGHER WJ PARKIN SSP LU Y BIAN XP MARLEY A ROCHE KP ALTMAN RA RISHTON SA JAHNES C SHAW TM XIAO G
Citation: Wj. Gallagher et al., MICROSTRUCTURED MAGNETIC TUNNEL-JUNCTIONS, Journal of applied physics, 81(8), 1997, pp. 3741-3746
SHAPE-ANISOTROPY-CONTROLLED MAGNETORESISTIVE RESPONSE IN MAGNETIC TUNNEL-JUNCTIONS
Authors: LU Y ALTMAN RA MARLEY A RISHTON SA TROUILLOUD PL XIAO G GALLAGHER WJ PARKIN SSP
Citation: Y. Lu et al., SHAPE-ANISOTROPY-CONTROLLED MAGNETORESISTIVE RESPONSE IN MAGNETIC TUNNEL-JUNCTIONS, Applied physics letters, 70(19), 1997, pp. 2610-2612
ELECTRON-BEAM MICROCOLUMNS FOR LITHOGRAPHY AND RELATED APPLICATIONS
Authors: CHANG THP THOMSON MGR KRATSCHMER E KIM HS YU ML LEE KY RISHTON SA HUSSEY BW ZOLGHARNAIN S
Citation: Thp. Chang et al., ELECTRON-BEAM MICROCOLUMNS FOR LITHOGRAPHY AND RELATED APPLICATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3774-3781
EXPERIMENTAL EVALUATION OF A 20X20 MM FOOTPRINT MICROCOLUMN
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML ZOLGHARNAIN S HUSSEY BW CHANG THP
Citation: E. Kratschmer et al., EXPERIMENTAL EVALUATION OF A 20X20 MM FOOTPRINT MICROCOLUMN, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3792-3796
ELECTRON-BEAM TECHNOLOGY - SEM TO MICROCOLUMN
Authors: CHANG THP THOMSON MGR YU ML KRATSCHMER E KIM HS LEE KY RISHTON SA ZOLGHARNAIN S
Citation: Thp. Chang et al., ELECTRON-BEAM TECHNOLOGY - SEM TO MICROCOLUMN, Microelectronic engineering, 32(1-4), 1996, pp. 113-130
MICROCOLUMN BASED LOW-ENERGY E-BEAM WRITING
Authors: STEBLER C DESPONT M STAUFER U CHANG THP LEE KY RISHTON SA
Citation: C. Stebler et al., MICROCOLUMN BASED LOW-ENERGY E-BEAM WRITING, Microelectronic engineering, 30(1-4), 1996, pp. 45-48
NANOSCALE REPLICATION FOR SCANNING PROBE DATA-STORAGE
Authors: TERRIS BD MAMIN HJ BEST ME LOGAN JA RUGAR D RISHTON SA
Citation: Bd. Terris et al., NANOSCALE REPLICATION FOR SCANNING PROBE DATA-STORAGE, Applied physics letters, 69(27), 1996, pp. 4262-4264
AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT, AND STABILITY
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML CHANG THP
Citation: E. Kratschmer et al., AN ELECTRON-BEAM MICROCOLUMN WITH IMPROVED RESOLUTION, BEAM CURRENT, AND STABILITY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2498-2503
CHARACTERIZATION OF A GAAS METAL-SEMICONDUCTOR-METAL LOW-ENERGY-ELECTRON DETECTOR
Authors: ZOLGHARNAIN S LEE KY RISHTON SA KISKER D CHANG THP
Citation: S. Zolgharnain et al., CHARACTERIZATION OF A GAAS METAL-SEMICONDUCTOR-METAL LOW-ENERGY-ELECTRON DETECTOR, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2556-2560
MICROMACHINING APPLICATIONS OF A HIGH-RESOLUTION ULTRATHICK PHOTORESIST
Authors: LEE KY LABIANCA N RISHTON SA ZOLGHARNAIN S GELORME JD SHAW J CHANG THP
Citation: Ky. Lee et al., MICROMACHINING APPLICATIONS OF A HIGH-RESOLUTION ULTRATHICK PHOTORESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3012-3016
CMOS SCALING INTO THE 21ST-CENTURY - 0.1-MU-M AND BEYOND
Authors: TAUR Y MII YJ FRANK DJ WONG HS BUCHANAN DA WIND SJ RISHTON SA SAIHALASZ GA NOWAK EJ
Citation: Y. Taur et al., CMOS SCALING INTO THE 21ST-CENTURY - 0.1-MU-M AND BEYOND, IBM journal of research and development, 39(1-2), 1995, pp. 245-260
HIGH-ASPECT-RATIO ALIGNED MULTILAYER MICROSTRUCTURE FABRICATION
Authors: LEE KY RISHTON SA CHANG THP
Citation: Ky. Lee et al., HIGH-ASPECT-RATIO ALIGNED MULTILAYER MICROSTRUCTURE FABRICATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3425-3430
SUB-40 NM RESOLUTION 1 KEV SCANNING TUNNELING MICROSCOPE FIELD-EMISSION MICROCOLUMN
Authors: KRATSCHMER E KIM HS THOMSON MGR LEE KY RISHTON SA YU ML CHANG THP
Citation: E. Kratschmer et al., SUB-40 NM RESOLUTION 1 KEV SCANNING TUNNELING MICROSCOPE FIELD-EMISSION MICROCOLUMN, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3503-3507
TRANSISTOR PERFORMANCE AND ELECTRON-TRANSPORT PROPERTIES OF HIGH-PERFORMANCE INAS QUANTUM-WELL FETS
Authors: ZAHURAK JK ILIADIS AA RISHTON SA MASSELINK WT
Citation: Jk. Zahurak et al., TRANSISTOR PERFORMANCE AND ELECTRON-TRANSPORT PROPERTIES OF HIGH-PERFORMANCE INAS QUANTUM-WELL FETS, IEEE electron device letters, 15(12), 1994, pp. 489-492
ELECTRON-TRANSPORT IN INGAAS ALINAS HETEROSTRUCTURES AND ITS IMPACT ON TRANSISTOR PERFORMANCE/
Authors: ZAHURAK JK ILIADIS AA RISHTON SA MASSELINK WT
Citation: Jk. Zahurak et al., ELECTRON-TRANSPORT IN INGAAS ALINAS HETEROSTRUCTURES AND ITS IMPACT ON TRANSISTOR PERFORMANCE/, Journal of applied physics, 76(11), 1994, pp. 7642-7644
FABRICATION OF 3-TERMINAL RESONANT-TUNNELING DEVICES IN SILICON-BASEDMATERIAL
Authors: ZASLAVSKY A MILKOVE KR LEE YH CHAN KK STERN F GRUTZMACHER DA RISHTON SA STANIS C SEDGWICK TO
Citation: A. Zaslavsky et al., FABRICATION OF 3-TERMINAL RESONANT-TUNNELING DEVICES IN SILICON-BASEDMATERIAL, Applied physics letters, 64(13), 1994, pp. 1699-1701
INTEGRATED APPROACH TO QUANTUM-DOT FABRICATION
Authors: RISHTON SA LEE YH MILKOVE KR HONG JM BOEGLI V DEFRANZA M SIVAN U KERN DP
Citation: Sa. Rishton et al., INTEGRATED APPROACH TO QUANTUM-DOT FABRICATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2607-2611
HIGH-PERFORMANCE SUB-0.1 MU-M SILICON N-METAL OXIDE SEMICONDUCTOR TRANSISTORS WITH COMPOSITE METAL POLYSILICON GATES
Authors: RISHTON SA MII YJ KERN DP TAUR Y LEE KY LII T JENKINS K QUINLAN D BROWN T DANNER D SEWELL F POLCARI M
Citation: Sa. Rishton et al., HIGH-PERFORMANCE SUB-0.1 MU-M SILICON N-METAL OXIDE SEMICONDUCTOR TRANSISTORS WITH COMPOSITE METAL POLYSILICON GATES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2612-2614
WATER-SOLUBLE CONDUCTING POLYANILINES - APPLICATIONS IN LITHOGRAPHY
Authors: ANGELOPOULOS M PATEL N SHAW JM LABIANCA NC RISHTON SA
Citation: M. Angelopoulos et al., WATER-SOLUBLE CONDUCTING POLYANILINES - APPLICATIONS IN LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2794-2797
Risultati: 1-24 |