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ABE M
UCHIHASHI T
OHTA M
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SUGAWARA Y
MORITA S
Citation: M. Abe et al., DETECTION MECHANISM OF AN OPTICAL EVANESCENT FIELD USING A NONCONTACTMODE ATOMIC-FORCE MICROSCOPE WITH A FREQUENCY-MODULATION DETECTION METHOD, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 1512-1515
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OHTA M
SUGAWARA Y
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SIGEMATSU T
SUZUKI M
MORITA S
Citation: T. Uchihashi et al., DEVELOPMENT OF ULTRAHIGH-VACUUM ATOMIC-FORCE MICROSCOPY WITH FREQUENCY-MODULATION DETECTION AND ITS APPLICATION TO ELECTROSTATIC FORCE MEASUREMENT, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 1543-1546
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UCHIHASHI T
SUGAWARA Y
TSUKAMOTO T
OHTA M
MORITA S
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Citation: T. Uchihashi et al., ROLE OF A COVALENT BONDING INTERACTION IN NONCONTACT-MODE ATOMIC-FORCE MICROSCOPY ON SI(111)7X7, Physical review. B, Condensed matter, 56(15), 1997, pp. 9834-9840
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UCHIHASHI T
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MORITA S
Citation: Y. Sugawara et al., DENSITY SATURATION OF DENSELY CONTACT-ELECTRIFIED NEGATIVE CHARGES ONA THIN SILICON-OXIDE SAMPLE DUE TO THE COULOMB REPULSIVE FORCE, Philosophical magazine. A. Physics of condensed matter. Structure, defects and mechanical properties, 74(5), 1996, pp. 1339-1346
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MORITA S
Citation: T. Uchihashi et al., CORRELATION BETWEEN CONTACT-ELECTRIFIED CHARGE GROUPS ON A THIN SILICON-OXIDE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(2), 1996, pp. 1055-1059
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SUGAWARA Y
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MORITA S
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FUJITA D
YAKABE T
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UCHIHASHI T
Citation: H. Nejo et al., PROPAGATING ELECTRONS ALONG DOMAIN-WALLS OF AU(111) OBSERVED BY INTERFERENCE OF COHERENT ELECTRONS AT LOW-TEMPERATURE, Czechoslovak journal of Physics, 46, 1996, pp. 2357-2358
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FUKANO Y
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Citation: Y. Fukano et al., TIME-DEPENDENT DIELECTRIC-BREAKDOWN OF THIN SILICON-OXIDE USING DENSECONTACT ELECTRIFICATION, JPN J A P 1, 33(6B), 1994, pp. 3756-3760
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Citation: Y. Fukano et al., TIME EVOLUTION OF CONTACT-ELECTRIFIED ELECTRON DISSIPATION ON SILICON-OXIDE SURFACE INVESTIGATED USING NONCONTACT ATOMIC-FORCE MICROSCOPE, JPN J A P 1, 33(1B), 1994, pp. 379-382
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UCHIHASHI T
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Citation: Y. Fukano et al., PARAMETER DEPENDENCE OF STABLE STATE OF DENSELY CONTACT-ELECTRIFIED ELECTRONS ON THIN SILICON-OXIDE, JPN J A P 1, 33(12A), 1994, pp. 6739-6745
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OKUSAKO T
SUGAWARA Y
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Citation: T. Uchihashi et al., HEAT-TREATMENT AND STEAMING EFFECTS OF SILICON-OXIDE UPON ELECTRON DISSIPATION ON SILICON-OXIDE SURFACE, JPN J A P 2, 33(8A), 1994, pp. 120001128-120001130
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Citation: T. Okusako et al., DISSIPATION OF CONTACT ELECTRIFIED ELECTRONS ON DIELECTRIC THIN-FILMSWITH SILICON SUBSTRATE, JPN J A P 2, 33(7A), 1994, pp. 120000959-120000961
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YAMADA J
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MORITA S
Citation: T. Uchihashi et al., CONTACT ELECTRIFICATION ON THIN SRTIO3 FILM BY ATOMIC-FORCE MICROSCOPE, JPN J A P 2, 33(3A), 1994, pp. 120000374-120000376
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Citation: Y. Sugawara et al., SPATIAL-DISTRIBUTION AND ITS PHASE-TRANSITION OF DENSELY CONTACT-ELECTRIFIED ELECTRONS ON A THIN SILICON-OXIDE, JPN J A P 2, 33(1A), 1994, pp. 120000070-120000073
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SUGAWARA Y
MORITA S
FUKANO Y
UCHIHASHI T
OKUSAKO T
CHAYAHARA A
YAMANISHI Y
OASA T
Citation: Y. Sugawara et al., SPATIAL DISTRIBUTIONS OF DENSELY CONTACT-ELECTRIFIED CHARGES ON A THIN SILICON-OXIDE, JPN J A P 2, 33(1A), 1994, pp. 120000074-120000077
Authors:
SUGAWARA Y
FUKANO Y
UCHIHASHI T
OKUSAKO T
MORITA S
YAMANISHI Y
OASA T
OKADA T
Citation: Y. Sugawara et al., ATOMIC-FORCE MICROSCOPY STUDIES OF CONTACT-ELECTRIFIED CHARGES ON SILICON-OXIDE FILM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(3), 1994, pp. 1627-1630
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FUKANO Y
UCHIHASHI T
SUGAWARA Y
YAMANISHI Y
OASA T
Citation: S. Morita et al., DISSIPATION OF CONTACT-ELECTRIFIED CHARGE ON THIN SI-OXIDE STUDIED BYATOMIC-FORCE MICROSCOPY, Applied surface science, 75, 1994, pp. 151-156