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Results:
1-17
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Results: 17
Authors:
OKOSHI M
HANABUSA M
MIKI H
MATSUBARA T
KATOH T
Citation: M. Okoshi et al., APPLICATION OF SYNCHROTRON-RADIATION TO ABLATION OF FROZEN ACETONE TARGETS, Applied surface science, 129, 1998, pp. 440-443
Authors:
OKOSHI M
MANIWA T
HANABUSA M
Citation: M. Okoshi et al., CORROSION-RESISTANT IRON THIN-FILMS FORMED BY PULSED-LASER DEPOSITIONWITH CAST-IRON TARGETS, Applied surface science, 129, 1998, pp. 462-465
Authors:
OKOSHI M
HANABUSA M
OKUMA S
Citation: M. Okoshi et al., DEPOSITION OF CARBON THIN-FILMS BY FREE-ELECTRON LASER, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 144(1-4), 1998, pp. 147-151
Authors:
ISHIHARA S
HANABUSA M
Citation: S. Ishihara et M. Hanabusa, LASER-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF TITANIUM NITRIDE FILMS, Journal of applied physics, 84(1), 1998, pp. 596-599
Authors:
KOYA H
HANABUSA M
Citation: H. Koya et M. Hanabusa, TIME-DEPENDENT X-RAY PHOTOELECTRON-SPECTROSCOPY OBSERVED FOR DIMETHYLALUMINUM HYDRIDE ADSORBED ON SIO2, JPN J A P 1, 36(8), 1997, pp. 5233-5236
Authors:
OKOSHI M
HANABUSA M
MIYAKE K
Citation: M. Okoshi et al., PULSED-LASER DEPOSITION OF CORROSION-RESISTANT IRON THIN-FILMS, JPN J A P 2, 36(6B), 1997, pp. 801-804
Authors:
HANABUSA M
LIU ZX
NAKAMURA N
HASEGAWA H
Citation: M. Hanabusa et al., PULSED-LASER DEPOSITION OF SILICON FILMS FOR SOLAR-CELL APPLICATIONS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 367-370
Authors:
HANABUSA M
NITTA T
Citation: M. Hanabusa et T. Nitta, PHOTOCHEMICAL VAPOR-DEPOSITION OF AL THIN-FILMS ON TI, TIO2, AND PD SURFACES, Applied surface science, 106, 1996, pp. 22-27
Authors:
NITTA T
HANABUSA M
Citation: T. Nitta et M. Hanabusa, UV IRRADIATION EFFECTS IN AL CHEMICAL-VAPOR-DEPOSITION ON TITANIUM NITRIDE, Applied physics letters, 69(3), 1996, pp. 340-342
Authors:
NITTA T
NISHITANI K
HANABUSA M
Citation: T. Nitta et al., CATALYTIC AND PHOTOINDUCED EFFECTS OF TI AND TIO2 LAYERS ON AL FILM GROWTH BY CHEMICAL-VAPOR-DEPOSITION, JPN J A P 2, 34(11A), 1995, pp. 1500-1502
Authors:
HANABUSA M
TSUJIHARA K
Citation: M. Hanabusa et K. Tsujihara, DEPOSITION OF DIAMOND-LIKE CARBON-FILMS BY EXCIMER LASERS USING FROZEN ACETYLENE, IEEE journal of selected topics in quantum electronics, 1(3), 1995, pp. 848-851
Authors:
HANABUSA M
KOMATSU A
Citation: M. Hanabusa et A. Komatsu, UV-LIGHT IRRADIATION EFFECTS ON NUCLEATION DURING CHEMICAL-VAPOR-DEPOSITION OF AL FILMS, Applied surface science, 86(1-4), 1995, pp. 428-430
Authors:
HANABUSA M
TSUJIHARA K
Citation: M. Hanabusa et K. Tsujihara, DIAMOND-LIKE CARBON-FILMS DEPOSITED BY LASER-ABLATION USING FROZEN ACETYLENE TARGETS, Journal of applied physics, 78(6), 1995, pp. 4267-4269
Authors:
KAWAI T
OKAWA M
KOMATSU A
SHIMADA T
HANABUSA M
Citation: T. Kawai et al., PHOTOINITIATION EFFECT DURING PHOTOINDUCED DEPOSITION OF ALUMINUM FILMS USING DIMETHYLALUMINUM HYDRIDE, Applied surface science, 80, 1994, pp. 385-388
Authors:
OKAWA M
TSURUTA H
HANABUSA M
Citation: M. Okawa et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF ADSORPTION AND PHOTODISSOCIATION OF DIMETHYLALUMINUM HYDRIDE, Applied surface science, 80, 1994, pp. 444-448
Authors:
HANABUSA M
KOMATSU A
Citation: M. Hanabusa et A. Komatsu, PHOTOINDUCED MODIFICATION OF THE CATALYTIC REACTION OF TITANIUM-OXIDEAND PALLADIUM IN CHEMICAL-VAPOR-DEPOSITION OF AL FILMS, Applied physics letters, 65(14), 1994, pp. 1826-1828
Authors:
KAWAI T
HANABUSA M
Citation: T. Kawai et M. Hanabusa, NUCLEATION AND FILM GROWTH IN PHOTOCHEMICAL VAPOR-DEPOSITION OF ALUMINUM THIN-FILM USING DIMETHYLALUMINUM HYDRIDE, JPN J A P 1, 32(10), 1993, pp. 4690-4693
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