Authors:
Pinkas, J
Bastl, Z
Slouf, M
Podlaha, J
Stepnicka, P
Citation: J. Pinkas et al., Preparation and solid-state characterization of nickel(II) complexes with 1 '-(diphenylphosphino)ferrocenecarboxylic acid, NEW J CHEM, 25(9), 2001, pp. 1215-1220
Citation: H. Morita et al., Laser-induced thin film formation from a gaseous mixture of trimethylsilylacetylene and methyl acrylate, J PHOTOCH A, 140(3), 2001, pp. 243-248
Citation: M. Urbanova et al., IR laser-induced thermolysis and UV laser-induced photolysis of 1,3-diethyldisiloxane: chemical vapour deposition of nanotextured hydridoalkylsilicones, J MAT CHEM, 11(6), 2001, pp. 1557-1562
Authors:
Pola, J
Ouchi, A
Bastl, Z
Subrt, J
Sakuragi, M
Galikova, A
Galik, A
Citation: J. Pola et al., UV laser photodeposition of nanotextured poly(hydridomethylsiloxane) powder from gaseous 1,3-dimethyldisiloxane, CHEM VAPOR, 7(1), 2001, pp. 19
Authors:
Contera, SA
Yoshinobu, T
Iwasaki, H
Bastl, Z
Lostak, P
Citation: Sa. Contera et al., Atomic surface characterisation and modification of the layered compounds Bi2Se3, Bi1.9Sb0.1Se3 and Bi1.6Sb0.4Se3, ULTRAMICROS, 86(1-2), 2001, pp. 55-61
Citation: J. Pola et al., Atmospheric pressure chemical vapour deposition of selenium and tellurium films by UV laser photolysis of diethyl selenium and diethyl tellurium, APPL ORGAN, 15(11), 2001, pp. 924-930
Citation: J. Pola et al., Atmospheric pressure chemical vapour deposition of selenium films by KrF laser photolysis of dimethyl selenium, APPL SURF S, 172(3-4), 2001, pp. 220-224
Authors:
Kupcik, J
Bastl, Z
Subrt, J
Pola, J
Papadimitriou, VC
Prosmitis, AV
Papagiannakopoulos, P
Citation: J. Kupcik et al., IR laser-induced decomposition of hexamethyldisiloxane for chemical vapourdeposition of nano-structured hydrido(methyl)silicone powders, J AN AP PYR, 57(1), 2001, pp. 109-118
Authors:
Pola, J
Urbanova, M
Bastl, Z
Subrt, J
Sakuragi, M
Ouchi, A
Morita, H
Citation: J. Pola et al., Laser-induced formation of polymers from unsaturated (organyl)trimethylsilanes in the gas phase, POLYMER, 42(4), 2001, pp. 1311-1318
Authors:
Bastl, Z
Beneke, M
Brabec, L
Jaeger, NI
Hulstede, P
Novakova, J
Schulz-Ekloff, G
Citation: Z. Bastl et al., NaX-encaged Pt carbonyls: reversible substitution of CO ligands by oxygen and ammonia. Evidence for a conservation of the polynuclear Pt skeleton, PHYS CHEM P, 2(13), 2000, pp. 3099-3104
Authors:
Pola, J
Urbanova, M
Bastl, Z
Subrt, J
Papagiannakopoulos, P
Citation: J. Pola et al., IR laser-induced decomposition of 1,3-dimethyldisiloxane for chemical vapour deposition of nano-structured methyl(hydrido)silicone phases, J MAT CHEM, 10(6), 2000, pp. 1415-1418
Authors:
Balaz, P
Achimovicova, M
Bastl, Z
Ohtani, T
Sanchez, M
Citation: P. Balaz et al., Influence of mechanical activation on the alkaline leaching of enargite concentrate, HYDROMETALL, 54(2-3), 2000, pp. 205-216
Authors:
Pola, J
Bastl, Z
Urbanova, M
Subrt, J
Beckers, H
Citation: J. Pola et al., Perhydridosilicone films produced by IR laser-induced chemical vapour deposition from disiloxane, APPL ORGAN, 14(9), 2000, pp. 453-464
Citation: J. Pola et al., Chemical vapour deposition of selenium and tellurium films by UV laser photolysis of selenophene and tellurophene, APPL ORGAN, 14(11), 2000, pp. 715-720
Authors:
Pola, J
Urbanova, M
Diaz, L
Santos, M
Bastl, Z
Subrt, J
Citation: J. Pola et al., IR laser-induced thermolysis of silacyclopent-3-ene: extrusion of silyleneand chemical vapour deposition of polycarbosilane phases via reactions of silylene, buta-1,3-diene and methylene, J ORGMET CH, 605(2), 2000, pp. 202-208
Authors:
Pola, J
Vtek, J
Bastl, Z
Fajgar, R
Graschy, S
Hassler, K
Citation: J. Pola et al., Infrared laser-induced decomposition of tert-butylsilane for chemical vapour deposition of Si/C/H phases, MAIN GR MET, 22(9), 1999, pp. 545-552
Citation: A. Ouchi et al., UV-laser-induced photolysis of trimethyl(vinyloxy)silane for chemical vapour deposition of polysiloxane films, APPL ORGAN, 13(9), 1999, pp. 643-647
Authors:
Pola, J
Ouchi, A
Urbanova, M
Koga, Y
Bastl, Z
Subrt, J
Citation: J. Pola et al., UV laser-induced photolysis of silacyclopent-3-ene: unseparable photochemistry of reactant and product for chemical vapour deposition of Si/C/H polymer, J ORGMET CH, 575(2), 1999, pp. 246-250