Citation: Dc. Sheridan et al., Design of single and multiple zone junction termination extension structures for SiC power devices, SOL ST ELEC, 45(9), 2001, pp. 1659-1664
Authors:
Niu, GF
Cressler, JD
Zhang, SM
Ansley, WE
Webster, CS
Harame, DL
Citation: Gf. Niu et al., A unified approach to RF and microwave noise parameter modeling in bipolartransistors, IEEE DEVICE, 48(11), 2001, pp. 2568-2574
Authors:
Sheridan, DC
Niu, GF
Merrett, JN
Cressler, JD
Ellis, C
Tin, CC
Citation: Dc. Sheridan et al., Design and fabrication of planar guard ring termination for high-voltage SiC diodes, SOL ST ELEC, 44(8), 2000, pp. 1367-1372
Authors:
Niu, GF
Cressler, JD
Mathew, SJ
Subbanna, S
Citation: Gf. Niu et al., Cryogenic temperature non-scaling of linear resistance in n-MOSFETs exhibiting reverse short-channel effect, SOL ST ELEC, 44(8), 2000, pp. 1507-1509
Authors:
Niu, GF
Mathew, SJ
Cressler, JD
Subbanna, S
Citation: Gf. Niu et al., A novel channel resistance ratio method for effective channel length and series resistance extraction in MOSFETs, SOL ST ELEC, 44(7), 2000, pp. 1187-1189
Authors:
Shivaram, R
Niu, GF
Cressler, JD
Croke, ET
Citation: R. Shivaram et al., The effect of carbon content on the minority carrier lifetime in lattice-matched p(+)-Si/p-SiGeC/n-Si/n(+)-Si diodes, SOL ST ELEC, 44(3), 2000, pp. 559-563
Citation: G. Zhang et al., A comparison of npn and pnp profile design tradeoffs for complementary SiGeHBT Technology, SOL ST ELEC, 44(11), 2000, pp. 1949-1954
Authors:
Cressler, JD
Hamilton, MC
Mullinax, GS
Li, Y
Niu, GF
Marshall, CJ
Marshall, PW
Kim, HS
Palmer, MJ
Joseph, AJ
Freeman, G
Citation: Jd. Cressler et al., The effects of proton irradiation on the lateral and vertical scaling of UHV/CVD SiGeHBT BiCMOS technology, IEEE NUCL S, 47(6), 2000, pp. 2515-2520
Authors:
Zhang, SM
Niu, GF
Cressler, JD
Mathew, SJ
Gogineni, U
Clark, SD
Zampardi, P
Pierson, RL
Citation: Sm. Zhang et al., A comparison of the effects of gamma irradiation on SiGeHBT and GaAsHBT technologies, IEEE NUCL S, 47(6), 2000, pp. 2521-2527
Authors:
Niu, GF
Cressler, JD
Mathew, SJ
Subbanna, S
Citation: Gf. Niu et al., A channel resistance derivative method for effective channel length extraction in LDD MOSFET's, IEEE DEVICE, 47(3), 2000, pp. 648-650
Authors:
Niu, GF
Cressler, JD
Mathew, SJ
Subbanna, S
Citation: Gf. Niu et al., A total resistance slope-based effective channel mobility extraction method for deep submicrometer CMOS technology, IEEE DEVICE, 46(9), 1999, pp. 1912-1914
Authors:
Niu, GF
Cressler, JD
Gogineni, U
Joseph, AJ
Citation: Gf. Niu et al., A new common-emitter hybrid-pi small-signal equivalent circuit for bipolartransistors with significant neutral base recombination, IEEE DEVICE, 46(6), 1999, pp. 1166-1173